Method and device for measuring impedance and power of plasma
A plasma and power technology, applied in the field of plasma measurement, can solve problems such as plasma absorption power monitoring, and achieve the effects of simple principles and steps, low cost and high accuracy
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Embodiment 1
[0076] see figure 1 , the invention provides a method for measuring plasma impedance and power, comprising the following steps:
[0077] S1: Obtain voltage waveform and current waveform;
[0078] Specifically, waveform sampling is performed through a current probe and a voltage probe; waveform display and recording are performed through an oscilloscope.
[0079] S2: Obtain voltage amplitude and voltage phase according to the voltage waveform; obtain current amplitude and current phase according to the current waveform;
[0080] Specifically, the voltage waveform and the current waveform are divided into several sections with each sine cycle as a section;
[0081] Use MATLAB software (or other similar software) to perform fast Fourier analysis on the segmented voltage waveform and segmented current waveform, and obtain the voltage amplitude and voltage phase of each segment of the voltage waveform, and the current amplitude and sum of each segment of the current waveform. Cu...
Embodiment 2
[0113] see figure 2 , the present invention also provides a device for measuring plasma impedance and power, comprising:
[0114] vacuum chamber;
[0115] The inside of the vacuum chamber includes an upper electrode and a lower electrode arranged in parallel, plasma is generated between the upper electrode and the lower electrode, and working gas enters the plasma region through the upper electrode; the outer wall and the upper electrode are grounded;
[0116] A pulsed radio frequency power supply, connected to the lower electrode through a matching circuit, for applying a radio frequency voltage;
[0117] It should be noted that the waveform output by the pulsed radio frequency power supply is connected to the lower electrode after passing through the matching circuit. Under the excitation of this waveform (see image 3 ), the plasma is in an alternate state of "ignition-extinguishment-ignition", and the impedance and absorbed power of the plasma change drastically.
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