Unlock instant, AI-driven research and patent intelligence for your innovation.

Shape and position error interference measurement device and method for transparent hemispherical shell part

A form and position error and interferometric measurement technology, applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problem of inability to detect the thickness error of the shell, and achieve the effects of simple structure, high resolution and high precision

Active Publication Date: 2021-06-25
NAT UNIV OF DEFENSE TECH
View PDF8 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the above methods can only detect the surface error of the sphere or spherical shell parts, but cannot detect the thickness error of the shell

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Shape and position error interference measurement device and method for transparent hemispherical shell part
  • Shape and position error interference measurement device and method for transparent hemispherical shell part
  • Shape and position error interference measurement device and method for transparent hemispherical shell part

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] like figure 1 As shown, the shape and position error interferometric measurement device of the transparent hemispherical shell part of the present embodiment includes a vibration isolation platform on which a laser wavefront interferometer 1 and a translation platform 2 in the optical axis direction of the interferometer are respectively installed, and the light outlet of the laser wavefront interferometer 1 is set There is a spherical lens 11, and a shell yaw turntable 3 is installed on the interferometer optical axis direction translation platform 2, a shell yaw turntable 4 is installed on the shell yaw turntable 4, and a shell yaw turntable 4 is installed on the shell yaw turntable 4 Shell centering platform 5, on which there is a mounting position for installing the hemispherical shell 6 to be measured, and the axes of the shell deflection table 3 and the shell rotary table 4 meet at the measured The center of the hemispherical shell 6.

[0032] In this embodiment,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a shape and position error interference measurement device and method for a transparent hemispherical shell part. The device comprises a vibration isolation platform provided with a laser wave surface interferometer and an interferometer optical axis direction translation platform, wherein the light outlet of the laser wave surface interferometer is provided with a spherical lens, a shell deflection rotary table is installed on the interferometer optical axis direction translation platform, a shell rotation rotary table is installed on the shell deflection rotary table, a shell centering platform is installed on the shell rotation rotary table, an installation position used for installing a measured hemispherical shell is arranged on the shell centering platform, the axis of the shell deflection rotary table and the axis of the shell rotation rotary table intersect at the sphere center of the measured hemispherical shell. According to the invention, the device can be used for the interference measurement of the surface shape error and thickness difference of the inner and outer spherical surfaces of the transparent hemispherical shell, and has the advantages of simple structure and high precision; and the method is based on the phase shift interference sub-aperture scanning splicing principle, the measurement range is large, and the resolution ratio is high.

Description

technical field [0001] The invention relates to the technical field of optical precision measurement, in particular to a shape and position error interferometric measurement device and method of a transparent hemispherical shell part. Background technique [0002] Transparent hemispherical shell parts such as high-quality fused silica hemispherical resonator is a key part in the hemispherical resonator gyroscope. Its shape is a hemispherical thin-walled shell with a central anchor column, and its diameter is generally Wall thickness is generally 0.3 ~ 1.1mm. An ideal harmonic oscillator should have a high quality factor, elastic material and isotropy of energy dissipation, but the actual processing technology is limited by the precision of the machine tool, resulting in uneven shape and thickness difference between the inner and outer spherical surfaces of the hemispherical shell, correspondingly The uneven mass distribution of the harmonic oscillator, especially the exist...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/24G01B11/06G01B9/02
CPCG01B11/2441G01B11/06G01B9/02
Inventor 陈善勇戴一帆薛帅王序翟德德刘俊峰
Owner NAT UNIV OF DEFENSE TECH
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More