Preparation method of WO3 gas-sensitive material, prepared gas-sensitive material and application of gas-sensitive material

A gas-sensitive material and reaction system technology, which is applied in material resistance, material analysis, material analysis by electromagnetic means, etc., can solve problems such as difficulty, and achieve simple preparation methods, easy miniaturization, good response and selectivity. Effect

Active Publication Date: 2021-06-25
HEFEI MICRO NANO SENSING TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] For example, the patent application whose publication number is CN108483498A discloses a kind of WO with controllable thickness for trimethylamine gas sensor. 3 Preparation method of nanosheets, this patent application prepares WO with controllable thickness 3 nanosheets, while coating the nanosheets on Al 2 o 3 ceramic tube, but the gas sensor in this patent application has a response value of 8.2 to 250ppm trimethylamine gas, which is difficult to meet the needs of practical applications

Method used

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  • Preparation method of WO3 gas-sensitive material, prepared gas-sensitive material and application of gas-sensitive material
  • Preparation method of WO3 gas-sensitive material, prepared gas-sensitive material and application of gas-sensitive material
  • Preparation method of WO3 gas-sensitive material, prepared gas-sensitive material and application of gas-sensitive material

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0064] Based on WO 3 The preparation method of the MEMS gas sensor of gas sensitive material, comprises the following steps:

[0065] (1) Preparation of WO 3 Gas sensitive material: 3g Na 2 WO 4 2H 2 O was dissolved in 20ml of water, and under the condition of stirring, sulfuric acid with a concentration of 6mol / L was added dropwise to adjust the H of the solution. + The concentration value is 2.4mol / L, stirred for 2h, kept at 30°C for 24h, washed the obtained precipitate with water and ethanol alternately, dried at 80°C for 12h, and then heat-treated at 300°C for 2h to obtain WO 3 gas sensitive material. where H + The determination method of the concentration is a prior art, and will not be described in detail in this embodiment.

[0066] (2) Based on WO 3 Preparation of MEMS sensitive chip of gas sensitive material: the WO 3 After the gas-sensitive material is mixed with a solvent, it is ball-milled to make a uniform slurry, where the solvent includes but not limite...

Embodiment 2

[0069] Based on WO 3 The preparation method of the MEMS gas sensor of gas sensitive material, comprises the following steps:

[0070] (1) Preparation of WO 3 Gas sensitive material: 3g Na 2 WO 4 2H 2 O was dissolved in 20ml of water, and under the condition of stirring, sulfuric acid with a concentration of 6mol / L was added dropwise to adjust the H of the solution. + The concentration value is 2.4mol / L, stirred for 2h, kept at 30°C for 24h, washed the obtained precipitate with water and ethanol alternately by centrifugation, dried at 80°C for 12h, and heat-treated at 500°C for 2h to obtain WO 3 gas sensitive material. where H + The determination method of the concentration is a prior art, and will not be described in detail in this embodiment.

[0071] (2) Based on WO 3 Preparation of MEMS sensitive chip of gas sensitive material: the WO 3 After the gas-sensitive material is mixed with a solvent, it is ball-milled to make a uniform slurry, where the solvent includes b...

Embodiment 3

[0074] Based on WO 3 The preparation method of the MEMS gas sensor of gas sensitive material, comprises the following steps:

[0075] (1) Preparation of WO 3 Gas sensitive material: 0.5g Na 2 WO 4 2H 2 O and 0.3 g of citric acid were dissolved in 30 ml of water, and after stirring for 30 min, under stirring conditions, 6 mol / L of hydrochloric acid was added dropwise to adjust the H of the solution. + The concentration is 0.1mol / L. After stirring for 60 minutes, the mixed solution was transferred to a 50ml reaction kettle, put into a drying oven, and reacted at 200°C for 12 hours. After the hydrothermal reaction, the precipitate was alternately centrifuged with water and ethanol, dried at 80°C for 4h, and heat-treated at 450°C for 1h to obtain WO 3 gas sensitive material. where H + The determination method of the concentration is a prior art, and will not be described in detail in this embodiment.

[0076] (2) Based on WO 3 Preparation of MEMS sensitive chip of gas se...

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Abstract

The invention discloses a preparation method of a WO3 gas-sensitive material, and relates to the technical field of MEMS gas sensors. The preparation method comprises the following steps: acidizing sodium tungstate, controlling the concentration of acid adopted during acidizing to be 1-8 mol/L, controlling the H<+> concentration of a solution to be 0.001-3 mol/L, stabilizing a mixed reaction system, cleaning and drying a product after stabilizing, and then carrying out heat treatment to obtain the WO3 gas-sensitive material. The invention also provides the WO3 gas-sensitive material prepared by adopting the method and application of the WO3 gas-sensitive material. According to the invention, the WO3 gas-sensitive material prepared by the preparation method has a relatively high response value to trimethylamine, the response value to 50ppm trimethylamine can be up to 83, and compared with common gas detection, the WO3 gas-sensitive material has very good selectivity; and the sensitivity to trimethylamine with the concentration of 10ppm is relatively high.

Description

technical field [0001] The invention relates to the technical field of gas sensors, in particular to a WO 3 The preparation method of the gas-sensitive material, the prepared gas-sensitive material and its application. Background technique [0002] In daily life, trimethylamine (TMA) is usually produced during the deterioration of fish and seafood. As the freshness of fish decreases, the trimethylamine in the fish body increases, and the fishy smell becomes stronger. Therefore, the measured value of trimethylamine can be used as an important parameter of fish corruption. According to reports (Y.Wang, S.Zhang, C.Huang, F.Qu, D.Yao, H.Guo, H.Xu, C.Jiang and M.Yang, Dalton Trans., Mesoporous WO3 modified by Aunanoparticles for enhanced trimethylamine gas sensing properties, 2020, DOI: 10.1039 / D0DT03131C), TMA concentration less than 10ppm is considered fresh; TMA concentration range of 10-50ppm is initial spoilage, TMA concentration greater than 60ppm is the process of spoila...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/12
CPCG01N27/125Y02A50/20
Inventor 吴秋菊高陈胡文利荣钱姚冬婷杨正张伟项小婷
Owner HEFEI MICRO NANO SENSING TECH CO LTD
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