Nonlinear slit optical waveguide and preparation method and application thereof

A slit waveguide and nonlinear technology, applied in the field of nonlinear slit optical waveguide and its preparation, can solve the problem of unsatisfactory nonlinear effect of slit waveguide, etc., and achieve stable nonlinear enhancement effect, quality and stability, increase Effects of stability and flexibility

Pending Publication Date: 2021-07-09
SHENZHEN UNIV
View PDF6 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a nonlinear slit optical waveguide and its preparation method to solve the technical problem that the nonlinear effect of the existing slit waveguide is not ideal

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nonlinear slit optical waveguide and preparation method and application thereof
  • Nonlinear slit optical waveguide and preparation method and application thereof
  • Nonlinear slit optical waveguide and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0041] On the other hand, the embodiment of the present invention also provides a preparation method of the above nonlinear slit optical waveguide. The preparation method of the nonlinear slit optical waveguide comprises the following steps:

[0042] S01: Provide the slit optical waveguide body;

[0043] S02: Form a solution containing a nonlinear enhancement material for light passage on the surface of a single crystal silicon layer provided with a slit waveguide to form a nonlinear enhancement layer, and make the nonlinear enhancement layer fill the slit of the slot waveguide and cover the surface of the slot waveguide.

[0044] In this way, the method for preparing a nonlinear slit optical waveguide according to the embodiment of the present invention directly forms a film of the solution of the nonlinear enhancement material used for light passage on the surface provided with the slit waveguide, so that the formed nonlinear enhancement layer can cover the slit waveguide ...

Embodiment 1- Embodiment 14

[0056] Embodiments 1 to 14 respectively provide a slot waveguide and a preparation method thereof. The slot waveguide structure in embodiment 1-embodiment 14 is as follows figure 1 with figure 2 As shown, the silicon base layer 10, the silicon oxide layer 20 and the single crystal silicon layer 30 are stacked in sequence, and the silicon base layer 10, the silicon oxide layer 20 and the single crystal silicon layer 30 form a slot waveguide body with a sandwich structure, wherein the single The crystalline silicon layer 30 includes a silicon waveguide 31 and a silicon waveguide 32 arranged in parallel, and a slot waveguide 40 is formed between the silicon waveguide 31 and the silicon waveguide 32 . The slot waveguide also includes a nonlinear enhancement layer 50, which covers the surface of the slot waveguide 40 and fills in the slot. Among them, the thickness of the silicon base layer 10 is 700 μm; the thickness of the silicon oxide layer 20 is 2 μm; the thickness h1 of th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
widthaaaaaaaaaa
lengthaaaaaaaaaa
Login to view more

Abstract

The invention discloses a nonlinear slit optical waveguide and a preparation method and application thereof. The nonlinear slit optical waveguide comprises a slit optical waveguide body, the slit optical waveguide body comprises a monocrystalline silicon layer, and a slit waveguide is arranged on the monocrystalline silicon layer. The nonlinear slit optical waveguide further comprises a nonlinear enhancement layer for light to pass through, and the nonlinear enhancement layer covers the surface provided with the slit waveguide and fills a slit. The nonlinear slit optical waveguide has a high nonlinear effect, so that the requirement on input signal power can be remarkably reduced, the conversion efficiency of nonlinear signal processing and the output power of converted signals are improved, and the stability and flexibility of the signal processing process are further improved. The process conditions of the preparation method of the nonlinear slit optical waveguide are easy to control, so that the prepared nonlinear enhancement layer is high and stable in quality, the nonlinear enhancement effect of the prepared nonlinear slit optical waveguide is stable, and the efficiency is high.

Description

technical field [0001] The invention belongs to the technical field of integrated photonics and silicon-based photonics, and specifically relates to a nonlinear slit optical waveguide and a preparation method and application thereof. Background technique [0002] In the nodes and terminals of optical networks, optical signal processing and high-performance optical computing based on optical nonlinear effects are particularly important. Optical nonlinear devices are key components to realize all-optical wavelength conversion, all-optical code conversion, optical decision gate, all-optical demultiplexing, all-optical sampling, 2R regeneration, all-optical logic operation, and reconfigurable programmable photon computing. [0003] With the rapid development of optical communication, discrete nonlinear devices (such as highly nonlinear optical fibers) can no longer meet the requirements of high integration and high performance of the system, and the research and development of n...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B6/122G02B6/13
CPCG02B6/122G02B6/13G02B2006/12166
Inventor 雷蕾王永华何苏叶飘飘董文婵
Owner SHENZHEN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap