Immersion liquid supply and recovery device for immersion type photoetching machine
An immersion lithography and recovery device technology, applied in the field of lithography machines, can solve problems such as changes in vibration characteristics and heat conduction characteristics, affecting the exposure optical path, and immersion flow field pulling, etc., to achieve the effect of improving vibration characteristics
Active Publication Date: 2021-07-20
ZHEJIANG UNIV +1
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Problems solved by technology
However, the relative movement of the substrate relative to the immersion liquid supply and recovery device will cause the immersion flow field to be directional pulled
During the high-speed movement of the substrate, the effect of this pulling movement is obvious, which may cause the immersion liquid seal to fail and the immersion liquid to leak; it may cause air bubbles to be involved in the immersion liquid, affecting the exposure optical path; or the immersion liquid recovery channel The flow pattern of the gas-liquid two-phase flow changes, resulting in changes in its vibration characteristics and heat conduction characteristics, which ultimately affect the exposure quality
Method used
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[0033] Figure 4~6 An embodiment of the immersion liquid supply and recovery device 2 according to the present invention is shown. For simplicity, Figure 4 Only a cross section of one side of the immersion liquid supply and recovery device 2 is shown. The immersion liquid supply and recovery device sets a vertical liquid injection port 28 on the radial inner side of the pumping opening 24 to supply the immersion liquid toward the substrate 3, preventing the meniscus 41 from retreating to the inner side of the circular through hole 21 and interfering with the laser light path; A gas injection port 29 is provided radially outside the exhaust opening 24 to provide positive pressure air flow to the periphery of the submerged flow field 4 and assist in confining the meniscus 41 . A pinning band 27 is provided between two adjacent suction openings 24 , and in this embodiment the structural form of the pinning band 27 protrudes from the boss of the lower end surface 270 of the mai...
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The invention discloses an immersion liquid supply and recovery device for an immersion type photoetching machine. The device comprises an immersion liquid supply channel, an immersion liquid recovery channel and pumping and drainage openings, wherein a pinning belt is arranged between every two adjacent pumping and drainage openings. The pinning belt is provided with an inner pinning belt and an outer pinning belt which are respectively used for limiting inward retreating and outward advancing of the meniscus, so that the sealing capability of an immersion flow field can be improved, the vibration characteristic of the immersion liquid recovery channel can be improved, and the exposure quality of a substrate can be improved.
Description
technical field [0001] The invention relates to the technical field of photolithography machines, in particular to an immersion liquid supply and recovery device for an immersion photolithography machine. Background technique [0002] The lithography machine is one of the core equipment for manufacturing VLSI. The modern lithography machine is mainly based on optical lithography. It uses the optical system to accurately project and expose the pattern on the mask plate to the substrate coated with photoresist. on the bottom. It includes a laser light source, a projection objective lens system, a projection mask composed of chip graphics, an alignment system and a substrate coated with photosensitive photoresist. [0003] Compared with the dry lithography machine in which the intermediate medium is gas, the immersion lithography (Immersion Lithography) equipment fills a liquid with a high refractive index between the last projection objective lens and the substrate, and impro...
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IPC IPC(8): G03F7/20
CPCG03F7/2041G03F7/70341
Inventor 付新王晓波吴敏苏芮胡亮
Owner ZHEJIANG UNIV