Auxiliary scattering panel and its manufacturing method and display device

Abstract

An auxiliary scattering panel, a manufacturing method thereof, and a display device, the manufacturing method comprising the following steps: providing a base substrate; forming a metal circuit layer on the base substrate; forming a first passivation layer on the metal circuit layer and the base substrate; Using a mask, a first photoresist layer is made on the first passivation layer; the first passivation layer is etched for the first time to make a lens structure and a raised part; the first photoresist layer is peeled off; A planarization layer is formed on the first passivation layer; the first passivation layer is etched for a second time, the first passivation layer above the metal circuit layer is removed, and the raised part is still retained and exposed after the etching; A whole transparent electrode layer is deposited on the planarization layer, and the transparent electrode layer is laid along the planarization layer on the exposed protrusions, and then laid on the metal circuit layer and electrically connected with the metal circuit layer. The manufacturing method can avoid the problem of undercut, make the transparent electrode layer connect smoothly at the slope, and reduce the risk of rupture of the transparent electrode layer.

Description

technical field [0001] The present invention relates to the technical field of screen display, in particular to an auxiliary scattering panel used in conjunction with a display panel, a manufacturing method thereof, and a display device having the auxiliary scattering panel. Background technique [0002] Thin Film Transistor Liquid Crystal Display (TFT-LCD) can display high-definition, continuous and delicate images, and is increasingly favored by consumers. [0003] There is a new type of liquid crystal display technology, in which two liquid crystal cells are superimposed and used for display, one liquid crystal cell is a display panel, and the main function is to display the screen, and the other liquid crystal cell is an auxiliary scattering panel, which is provided with a lens structure, and its main function is diffuse light. By energizing the upper and lower electrodes in the scattering panel, a potential difference is formed to control the deflection of the liquid c...

AI Technical Summary

Problems solved by technology

[0005] Please refer to the next steps Figures 1g to 1h As shown, with the help of the planarization layer 15, the passivation layer 13 remaining outside the display area that is not covered by the planarization layer 15 is removed by a dry etching process, exposing the metal circuit layer 12. Due to the difference in the etch rate selectivity , the undercut phenomenon occurs in the passivation layer 13 (refer to the dotted line box 133 in the figure, the passivation layer 13 is indented to be located below the planarization layer 15), and then the entire transparent electrode layer 16 is fabricated on the planarization layer 15, The transparent electrode layer 16 covers the metal wiring layer 12 and the planarization layer 15 at the same time, but due to the undercut problem, the transparent electrode layer 16 is prone to breakage at the undercut position, such as Figure 1h As shown, the signal transmitted from the peripheral area cannot be transmitted to the transparent electrode layer 16 on the planarization layer 15, and thus the desired display effect cannot be achieved.

[0006] The existing technical problem solving method is: additionally design and purchase a mask (Msak), in the above Figure 1f Afterwards, the passivation layer 13 above the metal wiring layer 12 is removed by photolithography and dry etching (that is, the passivation layer 13 above the metal wiring layer 12 is no longer removed by the shielding of the planarization layer 15), but in this way It requires additional design and purchase of a mask, which increases the production cost

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