Manufacturing method of array substrate, array substrate and display panel
A technology for array substrates and manufacturing methods, which is applied in the field of array substrate manufacturing, can solve problems such as image retention on display screens, and achieve the effects of reducing impact, improving film quality, and preventing image retention
Pending Publication Date: 2021-07-23
BEIHAI HKC OPTOELECTRONICS TECH CO LTD +1
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[0003]
The main purpose of the embodiments of the present invention is to provide a method for manufacturing an array substrate, an array substrate, and a display panel, aiming to improve the defects of the above-mentioned display screens that are prone to image sticking
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[0031] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0032] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0033] It should be noted that all directional indications (such as u...
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Abstract
The invention discloses a manufacturing method of an array substrate, the array substrate and a display panel. The manufacturing method of the array substrate comprises the following steps: providing a substrate; sequentially forming a first metal layer, a gate insulation layer and an active layer on the substrate; and sequentially forming at least two layers of doped amorphous silicon thin films on the active layer, wherein the at least two layers of doped amorphous silicon thin films form a doped layer, and the doped amorphous silicon film is deposited by adopting a plasma chemical vapor deposition method. According to the invention, the plasma chemical vapor deposition method is adopted for deposition, the at least two layers of doped amorphous silicon films are formed at different deposition powers, one layer of the doped amorphous silicon film is deposited at low radio frequency power, the other layer of the doped amorphous silicon film is deposited at high radio frequency power, and the doped amorphous silicon films with different densities are formed, so film quality is improved, and influence on the doped amorphous silicon thin films and the active layer when the second metal layer is deposited is reduced; and thus, the occurrence of image residues is prevented.
Description
technical field [0001] The invention belongs to the technical field of manufacturing methods of array substrates, and in particular relates to a manufacturing method of array substrates, array substrates and display panels. Background technique [0002] Traditional array substrates use plasma chemical vapor deposition to deposit amorphous silicon thin films in heavily doped regions at one time with high radio frequency power. The film formation is simple, but the film quality defects are relatively large; In extreme cases, it is easy to damage the film quality of the doped amorphous silicon film. When the display displays a fixed picture for a long time, conductive ions gather on the surface of the alignment layer. When the ions gather enough driving voltage, the liquid crystal molecules will be polarized, causing the driving voltage to have no effect on the liquid crystal molecules. At this time, switch to In a picture, the ions that have been gathered cannot leave the sur...
Claims
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Login to View More IPC IPC(8): H01L21/77H01L27/12G02F1/1362
CPCH01L27/1259H01L21/77H01L27/1214G02F1/136277H01L2021/775
Inventor 陈阳张合静许哲豪袁海江
Owner BEIHAI HKC OPTOELECTRONICS TECH CO LTD