Film-forming apparatus and film-forming method for forming passivation film, and manufacturing method of solar cell element

一种成膜方法、钝化膜的技术，应用在电气元件、最终产品制造、可持续制造/加工等方向，能够解决无法充分抑制、损失等问题，达到抑制再结合、抑制损失、膜质好的效果

Active Publication Date: 2011-11-30
ULVAC INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, there is a problem that even if a passivation film is formed after nitrogen plasma treatment to form an oxygen excess region, the recombination of carriers in the solar cell element cannot be sufficiently suppressed if the film quality of the passivation film itself is not good. loss caused

Method used

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  • Film-forming apparatus and film-forming method for forming passivation film, and manufacturing method of solar cell element
  • Film-forming apparatus and film-forming method for forming passivation film, and manufacturing method of solar cell element
  • Film-forming apparatus and film-forming method for forming passivation film, and manufacturing method of solar cell element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] In this example, use figure 2 The shown film forming apparatus 2 forms a passivation film to fabricate a solar cell element.

[0048] First, an n-type diffusion layer 12 was formed on the surface of a p-type semiconductor substrate 11 (156 mm×156 mm) made of single-crystal silicon with a thickness of 220 μm in which unevenness was provided on the surface by texture etching. A plurality of these sheets are arranged on a tray to be a film-forming object S.

[0049] Next, at figure 2 The film formation device 2 shown is loaded with the film formation object S, and the following settings are made: substrate temperature: 350°C, SiH 4 Flow: 1500sccm, NH 3 Flow: 5000sccm, N 2 Flow rate: 6000sccm, frequency of high-frequency power supply 25: 13.56MHz, input power of high-frequency power supply 25: 1500W, pressure in vacuum chamber: 100Pa, E / S: 14mm, frequency of low-frequency power supply: 300kHz, input power of low-frequency power supply 26: 500W, and a passivation film...

Embodiment 2

[0053] In this example, the solar cell element 1 was produced under the same conditions as in Example 1 except that the input power of the low-frequency power supply 26 was 1000W.

Embodiment 3

[0055] In this example, in addition to using image 3 The solar cell element 1 was produced under the same conditions as in Example 1 except that the passivation film was formed using the film forming apparatus 3 shown.

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Abstract

Provided are a film-forming method and a film-forming device for forming passivation films that can sufficiently inhibit loss due to carrier re-binding, and a solar cell element manufacturing method using same. The device is provided with a mounting part (22) for mounting the film-forming target, a high frequency power source (25), and a shower plate (23) that is provided to face the film-forming target (S) that is mounted on the mounting part (22), introduces the film-forming gas, and to which is connected the high frequency power source and to which a high frequency voltage is applied. A low frequency power source (26) is connected to the shower plate or the substrate-mounting part and applies a lower frequency voltage. The film-forming method is implemented using said film-forming device, and said film-forming method is implemented when forming passivation films.

Description

technical field [0001] The present invention relates to a film forming device for forming a passivation film, a film forming method of a passivation film, and a method for manufacturing a solar cell element. Background technique [0002] A solar battery element attracting attention as a clean energy source is required to suppress loss of output characteristics in order to improve output characteristics. The cause of loss of output characteristics in a solar cell element includes optical loss such as reflection loss and transmission loss, and electrical loss such as loss due to carrier recombination and ohmic loss. [0003] For example, in Patent Document 1, in order to suppress reflection loss and suppress loss caused by carrier recombination, in a solar cell element including a semiconductor layer, a passivation film formed on the semiconductor layer, and an electrode, the semiconductor An oxygen excess region is formed between the passivation layer and the passivation lay...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/04
CPCY02E10/50H01L31/1868H01L31/02167H01L31/18Y02E10/547C23C16/5096H01L31/022425H01L31/1804Y02P70/50H01L31/0216H01L31/04
Inventor 久保昌司菊地诚斋藤一也渡井美和清水美穗
Owner ULVAC INC
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