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System and method of arc detection using dynamic threshold

A technology of arc detection and circuit system, applied in the direction of circuits, discharge tubes, accelerators, etc., can solve problems such as errors, limit the effectiveness of arc protection circuit 30, and fail to detect arc discharge status in time, so as to reduce uneven ionization Implantation, reducing the effect of unstable ion beam current

Pending Publication Date: 2021-07-23
AXCELIS TECHNOLOGIES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the use of a fixed threshold current limits the effectiveness of the arc protection circuit 30 because the threshold should be set high enough to avoid false triggering
However, due to different process recipes and operating conditions, the current supplied by the various power sources can vary enough that the fixed threshold current cannot detect some arcing conditions, if any, in a timely manner

Method used

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  • System and method of arc detection using dynamic threshold
  • System and method of arc detection using dynamic threshold
  • System and method of arc detection using dynamic threshold

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Embodiment Construction

[0033] The present invention is now described with reference to the drawings, wherein like reference numerals are used to refer to like elements throughout. The illustrations and the following description are exemplary rather than restrictive in nature. Accordingly, it should be understood that variations of the illustrated systems and methods, as well as other such implementations, in addition to those illustrated herein, are considered to fall within the scope of the invention and the appended claims. As used herein, the terms "module," "component," "system," "circuit," "element," "slice," "circuitry," etc., are intended to refer to one or more electronic components, computer-related A collection of entities, hardware, software (eg, software in execution), and / or firmware. For example, circuitry, a circuit, or similar terms can be a processor, a field programmable gate array (FPGA), a process running on a processor, a controller, an object, an executable, a storage device, ...

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Abstract

The present invention is directed to circuits, systems, and methods to quickly to quench an arc that may form between high voltage electrodes associated with an ion source to shorten the duration of the arc and mitigate non-uniform ion implantations. In one example, an arc detection circuit for detecting an arc in an ion implantation system includes an analog-to-digital converter (ADC) and an analysis circuit. The ADC is configured to convert a sensing current indicative of a current being supplied to an electrode in the ion implantation system to a digital current signal that quantifies the sensing current. The analysis circuit is configured to analyze the digital current signal to determine if the digital current signal meets threshold parameter value and in response to the digital current signal meeting the threshold parameter value, provide an arc detection signal to a trigger control circuit that activates an arc quenching mechanism.

Description

[0001] References to related applications [0002] This application claims priority to U.S. Application Serial No. 16 / 225,298, filed December 19, 2018, entitled "A SYSTEM AND METHOD OF ARCDETECTION USING DYNAMIC THRESHOLD," which reads Incorporated herein in its entirety by reference. technical field [0003] The present invention relates generally to ion implantation systems, and more particularly, to an arc detection circuit and method for detecting arcs that may form within an ion implantation system. Background technique [0004] Ion implantation systems are used to apply impurities (called dopant elements) into a semiconductor substrate or wafer (often called a workpiece). In such systems, an ion source ionizes the desired dopant element, and the ionized impurities are extracted from the ion source as an ion beam. Ion beams are directed (eg, swept) across respective workpieces to implant ionized dopants into the workpieces. The dopant ions modify the composition of t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/317H01J37/304H01J37/08
CPCH01J37/3171H01J37/241H01J2237/0206H01J37/248H05G1/54H01J37/08H01J2237/057H01J37/304H05H2277/12H05H2242/00H05H2007/082H05H2242/24H01J2237/0432H01J2237/2485H01J37/3023
Inventor 尤瑟夫·努里
Owner AXCELIS TECHNOLOGIES
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