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Method for preparing coating powder by adopting plasma vapor deposition process

A plasma gas, vapor deposition technology, applied in coating, ion implantation plating, metal material coating process, etc., to achieve the effect of good dispersion

Active Publication Date: 2021-08-06
株洲弗拉德科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Traditional plasma chemical vapor deposition coating composite materials (PVD coating composite materials) are generally larger products, such as coated blades, coated films, etc.; for coating coating on the surface of micron-sized powder materials, The traditional process generally adopts CVD process, but PVD process is used to prepare coating powder materials, and there are few reports

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  • Method for preparing coating powder by adopting plasma vapor deposition process

Examples

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Comparison scheme
Effect test

Embodiment 1

[0032] Such as figure 1 As shown, the present embodiment provides a fluidized plasma vapor deposition furnace. The furnace body 4 is provided with a feed port 4001 and a discharge port 4002. A positive electrode plate 3 and a negative electrode plate 1 are provided inside the furnace body 4. The positive electrode plate The number of 3 is more than 1, and each positive plate can be connected to the working gas and the plasma generator separately. The positive plate 3 is set above the negative plate 1 and keeps a certain working distance from the negative plate 1. The parallel space or nearly parallel space between them is the deposition area. A feed plate and a discharge plate are respectively connected between the negative plate 1 and the feed port 4001 and the discharge port 4002. The feed plate, the discharge plate and the negative plate 1 are connected to a vibrating device, which has the function of vibrating material delivery. An electric heating element 2 is arranged b...

Embodiment 2

[0038] This embodiment provides a method for preparing coating powder by plasma vapor deposition process, which is completed based on the fluidized plasma vapor deposition furnace in Example 1. The powder is artificial graphite particles, D50=15 μm, and the coating material is nanometer Silicon, the source gas is silane SiH 4 , the specific deposition process includes the following steps:

[0039] S1. Put 93kg of artificial graphite particles into the hopper at the upper end of the feed port 4001 of the fluidized plasma vapor deposition furnace, wait for the feed, and vacuumize the deposition furnace until the pressure in the furnace is 0.01 to 2 Torr;

[0040]S2. Power on the electric heating element, raise the temperature of the deposition furnace to 500°C, make the feed plate, negative plate and discharge plate in the state of vibrating feeding, open the feed port 4001 and the discharge port 4002, and the artificial graphite particles will flow in a controlled manner Seque...

Embodiment 3

[0045] This embodiment provides a method for preparing coating powder by plasma vapor deposition process, which is completed based on the fluidized plasma vapor deposition furnace in Example 1. The powder is artificial graphite particles, D50=15 μm, and the coating material is nanometer Silicon and nano-carbon, the source gas is silane SiH 4 and propylene, the specific deposition coating process includes the following steps:

[0046] S1. Put 85 kg of artificial graphite particles into the hopper at the upper end of the feed inlet 4001 of the fluidized plasma vapor deposition furnace, wait for the feed, and vacuumize the deposition furnace until the pressure in the furnace is 0.01 to 2 Torr;

[0047] S2. Power on the electric heating element, raise the temperature of the deposition furnace to 500°C, make the feed plate, negative plate 1 and discharge plate in the state of vibrating feeding, open the feed port 4001 and the discharge port 4002, and the flow of artificial graphite...

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Abstract

The invention discloses a method for preparing coating powder by adopting a plasma vapor deposition process. The coating powder comprises a base material and one or more coating materials deposited on the surface of the base material. The preparation method of the coating powder comprises the following steps of: depositing one or more coating materials on the surfaces of base material particles by adopting a plasma enhanced chemical vapor deposition process, wherein the plasma enhanced chemical vapor deposition process is carried out in a fluidized plasma vapor deposition furnace. The base material powder in the invention is in fluidized motion in the vapor deposition process, the coating materials are relatively uniformly distributed in the deposited composite powder in a nano particle form, and the coating materials rapidly generate a compact accumulation layer on the surfaces of the base material particles, so that the base material and the coating are firmly combined together, the composite powder particles are not bonded with one another, and the coating powder has good dispersity.

Description

technical field [0001] The invention relates to the technical field of vapor deposition and the technical field of coating powder, and more particularly, relates to a method for preparing coating powder by using a plasma vapor deposition process. Background technique [0002] Vapor deposition method is one of the main methods for preparing coated composite materials. It passes the source gas into the deposition furnace, and the source gas undergoes thermal decomposition under the action of high temperature, electric field, plasma field, etc., so that the active components are deposited on the substrate. The surface of the material forms a coating composite material, which has the characteristics of simple process and suitable for large-scale production. [0003] Traditional plasma chemical vapor deposition coating composite materials (PVD coating composite materials) are generally larger products, such as coated blades, coated films, etc.; for coating coating on the surface ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/22C23C16/442C23C16/509
CPCC23C14/223C23C16/4417C23C16/442C23C16/509
Inventor 言伟雄袁建陵
Owner 株洲弗拉德科技有限公司
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