Method for preparing coating powder by adopting plasma vapor deposition process
A plasma vapor and vapor phase deposition technology, which is applied in the direction of coating, ion implantation plating, metal material coating process, etc., to achieve good dispersion effect
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Embodiment 1
[0033] Such as figure 1 with 2 As shown, the present embodiment provides a fluidized plasma vapor deposition furnace. The furnace body 4 is provided with a feed port 4001 and a discharge port 4002. The electric heating element 5 is arranged outside the furnace body 4. Inside the furnace body 4 is provided The positive plate 3 and the negative plate 1, the positive plate 3 is arranged above the negative plate 1, a certain working distance is kept between the positive plate 3 and the negative plate 1, the deposition area is between the positive plate 3 and the negative plate 1, the positive plate 3 and the There is a parallel space or approximately parallel space between the negative plates 1, and the negative plate 1 is connected with a vibrating device, which has the function of vibrating material delivery. A stirring and feeding mechanism 5 is provided below the negative plate 1, wherein the stirring and feeding mechanism can be a vertical stirring and feeding mechanism or a...
Embodiment 2
[0038] This embodiment provides a method for preparing coating powder by plasma vapor deposition process, which is completed based on the fluidized plasma vapor deposition furnace in Example 1. The powder is artificial graphite particles, D50=15 μm, and the coating material is nanometer Silicon, source gas is SiH 4 , the specific deposition process includes the following steps:
[0039] S1. Put 93kg of artificial graphite particles into the hopper at the upper end of the feed port 4001 of the fluidized plasma vapor deposition furnace, wait for the feed, and vacuumize the deposition furnace until the pressure in the furnace is 0.01 to 2 Torr;
[0040]S2. The electric heating element is energized, and the temperature of the deposition furnace is raised to 500°C, so that the negative plate 1 is in a vibrating working state, and the speed of the feeding and stirring mechanism 5 is adjusted to the speed required by the process, and the stirring and feeding mechanism 5 is used to tr...
Embodiment 3
[0045] This embodiment provides a method for preparing coating powder by plasma vapor deposition process, which is completed based on the fluidized plasma vapor deposition furnace in Example 1. The powder is artificial graphite particles, D50=15 μm, and the coating material is nanometer Silicon and nano carbon, the source gas is SiH 4 and propylene, the specific deposition coating process includes the following steps:
[0046] S1. Put 85kg of artificial graphite particles into a fluidized plasma vapor deposition furnace, and vacuumize the deposition furnace until the pressure in the furnace is 0.01 to 2 Torr;
[0047] S2. Power on the electric heating element, raise the temperature of the deposition furnace to 500°C, put the negative plate 1 in a vibrating working state, adjust the speed of the feeding and stirring mechanism 5 to the speed required by the process, and stir and feed the powder under the negative plate 1 Transported to the negative plate 1, the negative plate 1...
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