UV-LED based on asymmetric quantum well structure and preparation method thereof
A UV-LED, asymmetric technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of narrow spectrum, narrow luminescence peak, single quantum well structure, etc., to achieve the effect of good performance
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[0039] Such as figure 1 Shown, preparation is based on asymmetric quantum well structure UV-LED, and its steps include:
[0040] (1) Deposition of n-type Al on the surface of sapphire substrate by MOCVD method 0.55 Ga 0.45 N layers, such as figure 1 Shown; growing n-type Al 0.55 Ga 0.45 N layer method: trimethylgalliumtrimethylaluminum and NH 3 As Ga source, Al source and N source respectively, the carrier gas is H 2 or N 2 , the growth temperature is 1000℃, the growth thickness is 2μm, the doping source is methane, and the carrier concentration is 1*10 18 -1*10 19 cm -3 ;
[0041] (2) MBE method in n-type Al 0.55 Ga 0.45 N-layer epitaxial Al with 2 cycles 0.45 Ga 0.55 N / Al 0.55 Ga 0.45 N quantum wells, such as figure 2 Shown; metal Ga, Al as the metal source, N plasma provides the N source, the growth temperature is 900 ° C, Al 0.45 Ga 0.55 N thickness is 3nm, Al 0.55 Ga 0.45 N thickness is 7nm;
[0042] (3) MBE method in 2 cycles of Al 0.45 Ga 0.55 N...
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