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Wavelength selection filter, method of manufacturing wavelength selection filter, and display device

A wavelength selection and optical filter technology, which is applied in the manufacture of semiconductor/solid-state devices, optical components used to change the spectral characteristics of emitted light, filters, etc. The effect of suppressing color mixing

Pending Publication Date: 2021-10-08
TOPPAN PRINTING CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is necessary to use a SOQ (Silicon on Quartz) substrate in which single crystal Si is formed on a substrate made of synthetic quartz, which increases the manufacturing cost.

Method used

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  • Wavelength selection filter, method of manufacturing wavelength selection filter, and display device
  • Wavelength selection filter, method of manufacturing wavelength selection filter, and display device
  • Wavelength selection filter, method of manufacturing wavelength selection filter, and display device

Examples

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no. 1 Embodiment approach

[0044] refer to Figure 1 to Figure 12 The first embodiment will be described. The first embodiment is an embodiment of a wavelength selective filter and a method of manufacturing the wavelength selective filter. The wavelength selective filter has a function of extracting light in a specific wavelength range from light incident on the wavelength selective filter by reflection or transmission. The wavelength range to be selected by the wavelength selection filter is not particularly limited. For example, the wavelength selection filter extracts light in a specific wavelength range from light that can be visually recognized by human eyes, that is, light in the visible range. Below, the wavelength of light in the visible region is greater than or equal to 400 nm and less than or equal to 800 nm.

[0045] [Overall structure of wavelength selective filter]

[0046] Such as figure 1 As shown, the wavelength selection filter 10 has a substrate 11 , a first low-refractive index r...

no. 2 Embodiment approach

[0161] refer to Figure 13 to Figure 16 A second embodiment will be described. The second embodiment is an embodiment of a wavelength selective filter and a method of manufacturing the wavelength selective filter. Hereinafter, the difference between the second embodiment and the first embodiment will be mainly described, and the same components as those in the first embodiment will be given the same reference numerals and their descriptions will be omitted.

[0162] [Structure of wavelength selective filter]

[0163] refer to Figure 13 and Figure 14 The structure of the wavelength selection filter of the second embodiment will be described. Such as Figure 13 As shown, the wavelength selection filter 20 of the second embodiment has two resonant structure parts 21, that is, the resonant structure part 21 is composed of the first low-refractive index region 12 and the first lattice described in the first embodiment. A structure composed of the grating region 13 , the int...

no. 3 Embodiment approach

[0197] refer to Figure 17 and Figure 18 A third embodiment will be described. The third embodiment is an embodiment of a display device.

[0198] [Structure of Display Device]

[0199] Such as Figure 17 As shown, the display device 100 has a reflection layer 1 , a light source layer 2 , a wavelength conversion layer 3 , a wavelength selection layer 4 , and a drive unit 5 . The wavelength conversion layer 3 is located on the light source layer 2 , and the wavelength selection layer 4 is located on the wavelength conversion layer 3 . The reflective layer 1 is located under the light source layer 2 , that is, on the opposite side of the wavelength conversion layer 3 with respect to the light source layer 2 . The drive unit 5 is connected to the light source layer 2 . The side where the wavelength selective layer 4 is located relative to the light source layer 2 is the front side of the display device 100 , and the side where the reflective layer 1 is located relative to ...

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Abstract

Provided is a wavelength selection filter, wherein the thickness of a first high refractive index part is T1, the thickness of a second high refractive index part is T2, the refractive index of the material of a high refractive index layer is n1, the refractive index of the material of an uneven structure layer is n2, the refractive index of the material of an embedded layer is n3, the area ratio of the first high refractive index part is R1, and the area ratio of the second high refractive index part is R2. n1>n2, n1>n3, and R1+R2>1. The value of T1*[n1*R1+n2*(1-R1)] is a first parameter, the value of T2*[n1*R2+n3*(1-R2)] is a second parameter, and the ratio of the second parameter to the first parameter is 0.7-1.3.

Description

technical field [0001] The present disclosure relates to a wavelength selective filter, a method of manufacturing the wavelength selective filter, and a display device. Background technique [0002] As an optical filter for filtering light by utilizing an optical phenomenon caused by a fine structure of an object, a wavelength selection filter utilizing a guided-mode resonance phenomenon has been proposed. The wavelength selective filter has a periodic diffraction grating smaller than the wavelength of light, that is, a sub-wavelength grating. When light enters the sub-wavelength grating, the emission of diffracted light to the space where the incident light is emitted is suppressed. The light in the wavelength region of the wavelength propagates while being multiple-reflected, causes resonance, and is strongly emitted as reflected light. [0003] For example, the color filter described in Patent Document 1 has a structure in which a plurality of protrusions constituting a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/50H01L33/60G02B5/18G02B5/20G02B5/26G02B5/28G09F9/30G09F9/33H01L27/32F21S2/00F21V9/20F21V9/32H05B33/02H05B33/12H01L51/50F21Y115/10F21Y115/15
CPCF21V9/20G02B5/26H01L33/60H01L33/50H01L33/58H01L2933/0058H01L25/0753G02B5/1809G02B5/203G02B5/1857G02F1/133521H10K59/35H10K2101/00H10K59/879G02B5/28G02B5/206H10K59/38H10K50/125G02B27/12H10K50/858G02B5/201
Inventor 川下雅史小田由香里安祐树石丸佳子
Owner TOPPAN PRINTING CO LTD
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