Ion-doped thin film transistor and preparation method thereof
A thin-film transistor and ion-doping technology, applied in transistors, semiconductor/solid-state device manufacturing, semiconductor devices, etc., to achieve the effects of simple and convenient operation, low cost, and low investment in equipment and raw materials
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[0039] The present invention also provides a method for preparing an ion-doped thin film transistor for preparing the above-mentioned ion-doped thin film transistor, the preparation method comprising:
[0040] S1. Providing a substrate and cleaning the substrate;
[0041] S2. Prepare a gate electrode on one surface of the substrate;
[0042] S3, performing hydrophilic treatment on the surface of the substrate away from the gate electrode;
[0043] S4. Prepare an insulating layer of high dielectric constant material doped with ions on the surface of the substrate away from the gate electrode by using an aqueous solution method;
[0044]S5, preparing a metal oxide semiconductor layer on the ion-doped high dielectric constant material insulating layer;
[0045] S6. Prepare a source electrode and a drain electrode on the metal oxide semiconductor layer to obtain an ion-doped thin film transistor.
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