Wet type wafer cleaning device for functional ceramic wafers

A functional ceramic, wet technology, applied in surface polishing machine tools, machine tools suitable for grinding workpiece edges, grinders, etc. Improve the efficiency of cleaning tablets, reduce labor input, and improve the efficiency of cleaning tablets

Pending Publication Date: 2021-10-22
GUIZHOU UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this method is relatively safe and will not damage the ceramic sheet, its efficiency is very low, the labor input is large, and some dust from the polishing will be scattered in the surrounding air, the working environment is poor, and it will cause damage to the health of workers. , in today's large market demand, it cannot meet the needs of large-scale production and processing at all

Method used

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  • Wet type wafer cleaning device for functional ceramic wafers
  • Wet type wafer cleaning device for functional ceramic wafers
  • Wet type wafer cleaning device for functional ceramic wafers

Examples

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Embodiment Construction

[0030] The present invention will be further described below in conjunction with the examples, but not as a basis for limiting the present invention.

[0031] Embodiments of the invention

[0032] A wet cleaning device for functional ceramic sheets, as attached Figure 1-3 As shown, a bracket 1 is included, a barrel is arranged above the bracket 1, a convex ring 2 is arranged on the peripheral surface of the barrel, and a driving wheel 3 cooperating with the convex ring 2 is provided on the bracket 1 below the convex ring 2 , the driving wheel 3 is connected with a drive motor 5 through a transmission device 4; the barrel includes a clean section 6, and the two ends of the clean section 6 are respectively connected with a trumpet-shaped discharge section 7 and a feed section 8, wherein the clean The inner walls of the segment 6 and the discharge section 7 are provided with several spirally arranged ribs 9, and the distance between adjacent ribs 9 is smaller than the minimum w...

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Abstract

The invention discloses a wet type wafer cleaning device for functional ceramic wafers. The wet type wafer cleaning device comprises a support, a barreling barrel is arranged above the support, a convex ring is arranged on the circumferential surface of the barreling barrel, a driving wheel matched with the convex ring is arranged on the support below the convex ring, and the driving wheel is connected with a driving motor through a transmission device; the barreling barrel comprises a wafer cleaning section, the two ends of the wafer cleaning section are respectively connected with a trumpet-shaped discharging section and a trumpet-shaped feeding section, a plurality of ribs which are spirally arranged are arranged on the inner walls of the wafer cleaning section and the discharging section, and the distance between the adjacent ribs is smaller than the minimum width of the functional ceramic wafers; a spraying pipe is arranged on the upper side in the barreling barrel in a suspending manner, a spraying head is arranged below the spraying pipe, and one end of the spraying pipe extends out of the barreling barrel and then is connected with a water supply device. The device has the characteristics of high wafer cleaning efficiency, low ceramic wafer damage rate, low labor investment, less dust distribution and good working environment.

Description

technical field [0001] The invention relates to a cleaning device for functional ceramic sheets, in particular to a wet cleaning device for functional ceramic sheets. Background technique [0002] Functional ceramics refer to materials whose non-mechanical properties are mainly used in applications. Such materials usually have one or more functions, such as electricity, magnetism, light, heat, chemistry, biology, etc.; some also have coupling functions. Such as piezoelectric, piezoelectric, pyroelectric, electro-optic, acousto-optic, magneto-optic, etc. With the rapid development of material science, various new properties and new applications of functional ceramic materials are constantly being recognized and actively developed. [0003] With the large-scale development and application of functional ceramics, the market demand is also increasing. The traditional preparation process and supporting equipment can no longer meet the needs of large-scale processing, and the cle...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B31/02B24B31/12
CPCB24B31/02B24B31/12
Inventor 孙鑫庞驰祝飞费自豪王卫杨靖葛鹏
Owner GUIZHOU UNIV
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