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Coaxial electron beam imaging equipment and implementation method

A technology of electron beam imaging and main electron beam, applied in circuits, discharge tubes, electrical components, etc., can solve the problem of inability to real-time co-location display or imaging, and achieve the effect of parallel co-location imaging and convenient adjustment

Active Publication Date: 2021-10-22
苏州矽视科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the prior art, due to the limitations of the principle and implementation, usually the optical microscope and the optical microscope will exist in the system as two independent components with a certain distance (the optical axes do not coincide), which requires the sample stage to have a large stroke , to meet the switching of positions; another disadvantage is that this method cannot be displayed or imaged in real time

Method used

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  • Coaxial electron beam imaging equipment and implementation method
  • Coaxial electron beam imaging equipment and implementation method
  • Coaxial electron beam imaging equipment and implementation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] A coaxial electron beam imaging device comprising:

[0040] an electron source for emitting the main electron beam;

[0041] The condenser lens is used to adjust the beam opening angle, that is, to converge the electron beam emitted by the electron source;

[0042] Confining membrane pores to confine stray electrons and beam currents;

[0043] an objective lens for focusing the incident primary electron beam onto the sample surface;

[0044] A detector for collecting electrons to form an image through photoelectric conversion;

[0045] The workbench is used to carry the sample and move and position the area to be measured below the optical axis. The workbench has displacement functions in the X and Y directions, and the workbench performs raster scanning movement along the imaging orientation centered on the position to be measured;

[0046] The optical microscope is used for imaging and positioning the area to be tested and correlating the position corresponding to ...

Embodiment 2

[0053] Such as figure 2As shown, the difference from Embodiment 1 is that it also includes a deflector, an annular reflector and a secondary electron detector. The deflector is used to focus the raster scanning of the main electron beam on the sample surface. The annular reflector is used for refracting the light path of the optical microscope, receiving signal electron bombardment and generating secondary electrons. At the same time, the central hole of the annular reflector allows the main electron beam to pass through the membrane hole of the annular reflector. The secondary electron detector is located on the same side of the optical microscope, and the Everhart-Thornley (E-T) detector can be used.

[0054] The specific operation steps of electron beam imaging equipment are as follows:

[0055] S1. First use an electron microscope equipped with a deflector to move the workpiece table to position the pattern to be measured under the electron microscope for imaging. At t...

Embodiment 3

[0060] Such as image 3 As shown, the difference from Embodiment 1 and Embodiment 2 is that a deflector is also included, and the deflector is used to focus the raster scanning of the main electron beam on the surface of the sample. The detector adopts a ring detector, and the surface of the ring detector is configured with a mirror surface, and the mirror surface forms an included angle with the optical axis of the electron optics, and the included angle may be 45°. The detector uses a silicon detector.

[0061] The specific operation steps of electron beam imaging equipment are as follows:

[0062] S1. First use an electron microscope equipped with a deflector to move the workpiece table to position the pattern to be measured under the electron microscope for imaging. At this time, record the coordinate position of the work table;

[0063] S2. The detector is a silicon detector. The main electron beam focuses on the surface of the object and excites the imaging signal elec...

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Abstract

The invention provides coaxial electron beam imaging equipment comprising: an electron source which used for emitting a main electron beam; a condenser lens which is used for adjusting a beam opening angle, namely converging electron beams emitted by the electron source; a limiting film hole which is used for limiting stray electrons and beam current; an objective lens which is used for focusing the incident main electron beam to the surface of a sample; a detector which is used for collecting an image formed from electrons through photoelectric conversion; a workbench which is used for bearing the sample and moving and positioning a to-be-detected area below the optical axis; and an optical microscope which is used for imaging and positioning the to-be-detected area and associating the position corresponding to the electronic optical axis. According to the invention, a refraction surface is configured, an object space light path of the optical microscope is guided into an electron optical light path to realize coaxiality or parallelism, meanwhile, the refraction surface becomes bombardment disabling of signal electrons excited by the surface of the sample and the signal electrons are received and detected by a secondary electron detector or an annular detector, and the position of the optical microscope is adjusted according to a detection result to realize parallel co-location imaging or successive imaging.

Description

technical field [0001] The invention relates to the technical field of electron beam imaging, in particular to an electron beam imaging device and a realization method for realizing coaxiality. Background technique [0002] Electron beam imaging equipment used for inspection or measurement in industry or laboratories, such as high-throughput (HighThroughput) microscopes, measuring microscopes (CDSEM), electron beam defect detection equipment, etc., all need to introduce optical microscopes to provide the samples for the area to be tested Provides rough positioning, or is used to establish a local coordinate system to provide a positional index for subsequent electron beam imaging. [0003] The invention patent with the patent announcement number CN106645250A discloses a scanning transmission electron microscope with optical imaging function, which realizes simultaneous optical observation and SEM observation, and can quickly switch between optical observation and STEM observ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/26H01J37/28G02B21/24
CPCH01J37/261H01J37/265H01J37/28G02B21/248
Inventor 赵焱
Owner 苏州矽视科技有限公司
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