igbt device and its manufacturing method
A manufacturing method and device technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of large current, increase the total concentration, accelerate the recombination speed of electrons and holes, and alleviate the problem of current concentration Effect
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Embodiment 1
[0034] The IGBT device can be divided into three areas, namely active regions, transition zones, and terminal districts, respectively. When the IGBT device is turned on, the back P-type collector begins to inject holes into the drift zone of the IGBT device. During the IGBT device shutdown, it is necessary to inject all the electrons and holes in the drift area during the transfer, and electrons from IGBT devices. The back is out, and the holes flow out from the front side of the IGBT device. The hole in the active region can flow directly from the frontal opening of the active region, but the front side of the terminal area does not currently flow, the hole of the terminal area mainly flows from the opening of the transition zone, which can cause a current in the transition zone. Concentration issues, the transition concentration of local currents, resulting in rising local temperatures, reducing the reliability of IGBT devices.
[0035] In order to solve the above problem, if Fi...
Embodiment 2
[0050] like Figure 5 As shown, the present embodiment provides an IGBT device comprising: a substrate 101, the substrate 101 comprising a relative first main surface and a second main surface, the first main surface forming an IGBT device The front structure includes a active region, a transition region, and a terminal region; an oxygen ion abduction layer 113 is formed in the second main surface of the transition zone and terminal region; the collector region 112 is formed in the The second main surface of the substrate 101; the hydrogen ion doping region 114 is formed in the second main surface of the substrate 101, and the oxygen ion defective layer 113 is located within the hydrogen ion doped region 114; The oxygen ions defective layer 113 reduces the hole life of the transition zone and the terminal region, while the oxygen ion of the oxygen ion abduction layer 113 is used as the adsorbent of the hydrogen ion to increase the hydrogen ion in the hydrogen ion doped region 114. ...
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