Apparatus for removing boron, method for removing boron, apparatus for producing pure water and method for producing pure water
A technology for manufacturing equipment and pure water, applied in chemical instruments and methods, neutralized water/sewage treatment, separation methods, etc., can solve the problems of reduced boron removal rate and inability to reduce boron, and achieve the effect of reducing boron content
Pending Publication Date: 2021-10-29
ORGANO CORP
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Problems solved by technology
In addition, if there are other ionic substances such as sodium in the water to be treated, the boron removal rate of the electrodeionization device (Japanese: Electrodeionization type deionization device) will decrease, and there is also a problem that boron cannot be reduced to an extremely low concentration.
Method used
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Effect test
Embodiment 1、2 and comparative example 1
[0050] use figure 1 Apparatus shown, for sodium 20ppm, calcium 10ppm, bicarbonate ion 30ppm CaCO 3 20m of water to be treated with 10ppm ionic silica, 50ppb boron, and 0.5ppm TOC concentration 3 / h, implement about 50 hours of water test. The low-pressure reverse osmosis membrane (BWRO) used CPA5-LD (trade name, manufactured by Hydranautics), and the recovery rate was 80%. The high-pressure reverse osmosis membrane (SWRO) used SW30HRLE-440 (trade name, manufactured by Dow Chemical Company), and the recovery rate was 90%. As EDI, EDI-XP (trade name, manufactured by Organo Co., Ltd.) was used, and the recovery rate was 90%. The operating current value is set to 5A.
Embodiment 1
[0054]
[0055] [Table 2]
Embodiment 3
[0057]
[0058] [table 3]
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Abstract
The present invention provides: an apparatus and method for efficiently removing boron from water to be processed; an apparatus for producing pure water; and a method for producing pure water. The present invention uses an apparatus for removing boron, which comprises: a low-pressure reverse osmosis membrane device to which water to be processed is supplied; a pH adjustment device which adjusts the pH of permeated water from the low-pressure reverse osmosis membrane device to a value of from 5.0 to 9.0; a high-pressure reverse osmosis membrane device to which the adjusted water, the pH of which has been adjusted by the pH adjustment device, is supplied; and an electric regeneration type deionization device to which permeated water from the high-pressure reverse osmosis membrane device is supplied. The present invention also uses a method for removing boron, which uses this apparatus. Preferably, the sodium concentration in the permeated water from the high-pressure reverse osmosis membrane device is 200 ppb or less, and the boron concentration in the water processed by the electric regeneration type deionization device is 50 ppt or less.
Description
technical field [0001] The present invention relates to a boron removal device, a boron removal method, and a pure water production device and a pure water production method. Background technique [0002] Conventionally, pure water such as ultrapure water obtained by highly removing organic substances, ionic components, fine particles, bacteria, etc. has been used for applications such as cleaning water in the manufacturing process of semiconductor devices and the manufacturing process of liquid crystal devices. In particular, when manufacturing electronic components including semiconductor devices, a large amount of pure water is used in the cleaning process, and the demand for water quality is increasing year by year. [0003] For example, reduction of boron as a trace impurity is required. Therefore, in order to reduce the boron concentration, a method of combining a high-pressure reverse osmosis membrane (high-pressure RO) conventionally used in seawater desalination an...
Claims
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IPC IPC(8): B01D61/44B01D61/58C02F9/04C02F9/06C02F9/08C02F9/12C02F1/32C02F1/42C02F1/44C02F1/469
CPCB01D61/58C02F1/32C02F1/42B01D61/025B01D2311/2603B01D2311/06B01D2311/18B01D2311/2619B01D2311/2623C02F9/00C02F1/66C02F1/441C02F1/4695C02F2101/108C02F2301/08C02F2103/04C02F1/20B01D61/026B01D61/44C02F2101/30C02F2301/066
Inventor 高桥一重须藤史生中村勇规柴崎贤治佐佐木庆介
Owner ORGANO CORP