Micro-etching processing technology for resin plug hole of dry film cover
A resin plug hole, processing technology, applied in printed circuits, electrical components, and chemical/electrolytic methods to remove conductive materials, etc., can solve problems such as uneven orifices, missing copper in the orifices, and small board line widths. To achieve the effect of good quality, good effect and smooth orifice
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Embodiment 1
[0036] A processing technology for micro-etching of resin plug holes in a dry film cover, comprising the following steps:
[0037] S1. Get the engineering data, open the window directly on the resin plug hole 3 of the outer layer cover, the size of the window is 6.5mil larger than the hole diameter on one side, and the alignment system uses a 2.0mm through hole as the alignment reference point;
[0038] S2. The outer layer adopts the newly designed negative film engineering data, and dry film 4 is pasted on both sides of the board surface, such as figure 1 As shown, and double-sided exposure, the exposure data is negative polarity;
[0039] S3. After standing still for ≥15min, develop. After development, the outer layer is scanned by AOI, and it is confirmed that the dry film 4 completely covers the position of the resin plug hole 3, such as figure 2 shown;
[0040] S4. According to the engineering MI instructions, reduce copper on the plate on the micro-etching line, and u...
Embodiment 2
[0050] A processing technology for micro-etching of resin plug holes in a dry film cover, comprising the following steps:
[0051] S1. Get the engineering data, open the window directly on the resin plug hole 3 of the outer layer cover, the size of the window is 6.5mil larger than the hole diameter on one side, and the alignment system uses a 2.0mm through hole as the alignment reference point;
[0052] S2. The outer layer adopts the newly designed negative film engineering data, and dry film 4 is pasted on both sides of the board surface, such as figure 1 As shown, and double-sided exposure, the exposure data is negative polarity;
[0053] S3. After standing still for ≥15min, develop. After development, the outer layer is scanned by AOI, and it is confirmed that the dry film 4 completely covers the position of the resin plug hole 3, such as figure 2 shown;
[0054] S4. According to the engineering MI instructions, reduce copper on the plate on the micro-etching line, and use...
Embodiment 3
[0064] A processing technology for micro-etching of resin plug holes in a dry film cover, comprising the following steps:
[0065] S1. Get the engineering data, open the window directly on the resin plug hole 3 of the outer layer cover, the size of the window is 6.5mil larger than the hole diameter on one side, and the alignment system uses a 2.0mm through hole as the alignment reference point;
[0066] S2. The outer layer adopts the newly designed negative film engineering data, and dry film 4 is pasted on both sides of the board surface, such as figure 1 As shown, and double-sided exposure, the exposure data is negative polarity;
[0067] S3. After standing still for ≥15min, develop. After development, the outer layer is scanned by AOI, and it is confirmed that the dry film 4 completely covers the position of the resin plug hole 3, such as figure 2 shown;
[0068] S4. According to the engineering MI instructions, reduce copper on the plate on the micro-etching line, and u...
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