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Wide-angle broadband antireflection film and manufacturing method thereof

An anti-reflection coating and wide-band technology, applied in optical components, optics, instruments, etc., can solve the problems of complex preparation process, long time-consuming, expensive equipment, etc.

Pending Publication Date: 2021-11-30
ZHEJIANG UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Electron beam evaporation and magnetron sputtering are mostly used for multilayer film structure, while reactive ion etching, electrostatic self-assembly and sol-gel method are used for nanometer low refractive index film layer. Most of these methods are complicated and time-consuming to prepare. Long, expensive equipment required

Method used

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  • Wide-angle broadband antireflection film and manufacturing method thereof
  • Wide-angle broadband antireflection film and manufacturing method thereof
  • Wide-angle broadband antireflection film and manufacturing method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0082] Embodiment 1: the grass-like aluminum oxide nanostructure film after deionized water treatment is used as the outermost film, with TiO 2 and SiO 2 Taking materials as an example to design a multi-layer anti-reflection coating in the 420nm-680nm band, the structure is as follows: Substrate|TiO 2 (8.0nm)|SiO 2 (54.5nm)|TiO 2 (27.3nm)|SiO 2 (35.7nm)|TiO 2 (36.3nm)|SiO 2 (46.9nm)|TiO 2 (11.2nm)|SiO 2 (39.2nm)|Al 2 o 3 (30nm), each film layer is deposited by electron beam evaporation and treated with high temperature water to achieve the anti-reflection effect of large angle and wide band. Its anti-reflection effect at various incident angles is as follows Image 6 As shown, in the 420-680nm visible light band, the average reflectivity of 0°, 20°, 40°, and 60° is 0.07%, 0.06%, 0.07%, and 0.55%.

Embodiment example 2

[0083] Implementation Case 2: The grass-like aluminum oxide nanostructure film after deionized water treatment is used as the outermost film, and the H 4 (lanthanum titanate) and SiO 2 Take the material as an example to design a multi-layer anti-reflection coating in the 420nm-680nm band. The structure is as follows: substrate|H 4 (15.3nm)|SiO 2 (46.8nm)|H 4 (41.6nm)|SiO 2 (21.1nm)|H 4 (181.5nm)|SiO 2 (33.8nm)|H 4 (15.0nm)|SiO 2 (40.0nm)|Al 2 o 3 (30nm), each film layer is deposited by electron beam evaporation and treated with high temperature water to achieve the anti-reflection effect of large angle and wide band. Its anti-reflection effect at various incident angles is as follows Figure 7 As shown, in the 420-680nm visible light band, the average reflectivity of 0°, 20°, 40°, and 60° is 0.04%, 0.04%, 0.04%, and 0.54%.

Embodiment example 3

[0084] Implementation Case 3: The grass-like aluminum oxide nanostructure film treated with deionized water is used as the outermost film, and the H 4 (lanthanum titanate), MgF 2 and SiO 2 Take the material as an example to design a multi-layer anti-reflection coating in the 420nm-680nm band. The structure is as follows: substrate|H 4 (13.3nm)|MgF 2 (50.2nm)|H 4 (33.7nm)|MgF 2 (48.3nm)|H 4 (34.9nm)|MgF 2 (31.1nm)|H 4 (15.0nm)|MgF 2 (32.2nm)|H 4 (40.4nm)|MgF 2 (34.3nm)|H 4 (58.1nm)|MgF 2 (38.2nm)|H 4 (19.1nm)|SiO 2 (41.3nm)|Al 2 o 3 (30.0nm), each film layer is deposited by electron beam evaporation and treated with high-temperature water to achieve the anti-reflection effect of large angle and wide band. Its anti-reflection effect at various incident angles is as follows Figure 8 As shown, in the 420-680nm visible light band, the average reflectivity of 0°, 20°, 40°, and 60° is 0.05%, 0.04%, 0.04%, and 0.57%.

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Abstract

The invention discloses a wide-angle broadband antireflection film. The wide-angle broadband antireflection film comprises a substrate; the wide-angle broadband antireflection film further comprises a high / low refractive index alternating film stack arranged on the substrate and a nano-structure ultralow refractive index film layer arranged on the top surface of the high / low refractive index alternating film stack. Based on a mature thin film deposition technology and a simple and rapid water corrosion method, the thickness and the effective refractive index of the gradient refractive index film layer are controlled through simple and convenient operation, and the residual reflectivity of the broadband at a large angle is adjusted through a multi-layer film structure. The wide-angle broadband antireflection film is suitable for large-area batch production, so that the cost of the antireflection film is greatly reduced; and the antireflection film is expected to be widely applied to optical elements, sensors, imaging optical systems, solar cells and other products, and contributes to the fields of national economy, social development, science and technology, national defense construction and the like in China.

Description

technical field [0001] The invention belongs to the technical field of anti-reflection film processing, and in particular relates to a large-angle wide-band anti-reflection film and a manufacturing method thereof. Background technique [0002] Anti-reflection film is an indispensable optical element in optical system, and it is the most widely used optical film at present. With the upgrading of products in mobile phones, security, vehicle, precision measurement and other application fields, the requirements for optical imaging systems are getting higher and higher, the number of lenses in the system is increasing, and the use of large curvature surfaces makes anti-reflection coatings with large angles and wide bands It becomes one of the key factors to reduce the stray light of the system and improve the imaging quality. In the design of broadband anti-reflection coatings, there is always a contradiction between the bandwidth of the anti-reflection spectral range and the av...

Claims

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Application Information

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IPC IPC(8): G02B1/115G02B27/00
CPCG02B1/115G02B27/0012
Inventor 沈伟东王海兰杨陈楹李强张占军金永红章岳光郑婷婷陈潇
Owner ZHEJIANG UNIV