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High-entropy alloy film capable of quantitatively controlling gradient change of element content and preparation method

A technology of element content and gradient change, applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve problems such as limited research

Active Publication Date: 2021-12-03
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, our research on it is very limited

Method used

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  • High-entropy alloy film capable of quantitatively controlling gradient change of element content and preparation method
  • High-entropy alloy film capable of quantitatively controlling gradient change of element content and preparation method
  • High-entropy alloy film capable of quantitatively controlling gradient change of element content and preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] A 5-element high-entropy alloy thin film composed of CrMnFeCoNi was prepared on a silicon substrate by intermittent magnetron sputtering. Simultaneously control the RF power supply and the DC power supply to sputter CrMnFeCoNi high-entropy alloy targets and pure manganese metal targets with nearly equiatomic ratio. To 0W, sputtering 4 times, the single sputtering time is 60min, the intermittent time is 20min, a total of 5.3 hours.

[0040] Gained high-entropy alloy thin film SEM test results are as follows figure 1 As shown, the results show that among the five elements, the content of manganese varies from 20at% to 42at%, while the content of the other four elements varies relatively little, and the total thickness of the high-entropy alloy film is 1.78μm. And the change of content gradient also caused the change of structure ( figure 2 ), the film structure evolves from the nanocrystalline structure on the surface to the amorphous structure inside. That is to say,...

Embodiment 2

[0042] Through intermittent magnetron sputtering, the radio frequency power supply and the DC power supply are simultaneously controlled to sputter the nearly equiatomic ratio CrMnFeCoNi high-entropy alloy target and pure manganese metal target. The power of the radio frequency power supply is fixed at 110W, and the power of the DC power supply is from 30W. Decrease to 0W at a speed of 7-8W each time, and sputter 5 times, with a single sputtering time of 30 minutes and an intermittent time of 15 minutes, a total of 3.75 hours. The film thickness was 1.72 μm. The high-entropy alloy thin film has a structure in which the manganese content changes gradually. Compared with other high-entropy alloy thin films, the thin film prepared by the method has both nanocrystalline and amorphous structures, and is a composite material.

Embodiment 3

[0044] The nearly equiatomic CrMnFeCoNi high-entropy alloy target and pure manganese metal target are sputtered by simultaneously controlling the radio frequency power supply and the direct current power supply in magnetron sputtering. The power of the RF power supply was fixed at 130W, and the power of the DC power supply was reduced from 30W at a rate of 6-7W each time. Sputtering was done 4 times, with a single sputtering time of 60 minutes and an intermittent time of 20 minutes, totaling 5.3 hours. The film thickness is about 2 μm. The film prepared by the invention has the characteristic of manganese element content gradient. Because the composition determines the structural characteristics of the film, more structural information can be found in films with varying content, which can be used as a method for high-throughput experiments.

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Abstract

The invention discloses a high-entropy alloy film capable of quantitatively controlling gradient change of element content and a preparation method. According to the method, magnetron sputtering is adopted, a direct current power supply and a radio frequency power supply are simultaneously controlled to carry out sputtering, and then the sputtering deposition rate of the required manganese element is controlled to reach the requirement of the high-entropy alloy film with the content gradient continuous change. The film is prepared from, by atomic percent, 20%-24% of Cr, 20%-42% of Mn, 16%-22% of Fe, 13%-19% of Co and 10%-13% of Ni, the content of the manganese element is changed in a large continuous gradient mode, and the sum of the atomic percent of all the components is 100%. According to the method, a sample of which the Mn element continuously and gradiently changes from 20 at% to 42 at% in the thickness direction of the high-entropy alloy film is obtained. According to the method, the influence of the content control on the high-entropy alloy can be effectively predicted, the optimal component is found, and the design target of a high-throughput experiment is met.

Description

technical field [0001] The invention belongs to the field of alloy materials, and in particular relates to a preparation method for quantitatively controlling the gradient change of element content along the thickness direction in a high-entropy alloy film sample. Background technique [0002] Since 2004, the emergence of high-entropy alloys has broken through the original design of traditional rare alloys and created new ideas for alloy design. It is composed of 5 or more elements with nearly equal atomic ratio, and the high mixing entropy caused by it can greatly reduce the Gibbs free energy and stabilize the solid solution phase. Therefore, the crystal structure of high-entropy alloys is relatively simple, rather than competing complex and brittle intermetallic phases. In addition, high-entropy alloys have stable high-temperature mechanical properties, excellent low-temperature fracture toughness, and good room temperature properties. [0003] High-entropy alloys are a ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/16C23C14/35C23C14/54C22C30/00
CPCC23C14/165C23C14/352C22C30/00C23C14/548
Inventor 黄平杨玥玥王飞
Owner XI AN JIAOTONG UNIV
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