Waste gas treatment device for chemical raw material production
Patent Information
- Authority / Receiving Office
- CN ยท China
- Current Assignee / Owner
- ้็็
- Publication Date
- 2021-12-14
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Abstract
Description
technical field
[0001] The invention relates to the technical field of waste gas treatment, in particular to a waste gas treatment device for chemical raw material production. Background technique
[0002] Chemical waste gas refers to the toxic and harmful gas discharged from chemical plants in chemical production. Chemical waste gas often contains many types of pollutants, complex physical and chemical properties, and different toxicity. It seriously pollutes the environment and affects human health. Different chemical production The chemical waste gas composition produced by the industry varies greatly.
[0003] According to the form of pollutants, chemical waste gas can be divided into particulate pollutants and gaseous pollutants. Due to the high content of toxic gases in chemical waste gas and the unclear composition, there is no clear method for subsequent treatment of waste gas. Therefore, at present, when treating exhaust gas particles, most of the particulate pollu...