Cleaning brush assembly and wafer cleaning device
A technology for cleaning brushes and components, applied in cleaning methods and utensils, electrical components, chemical instruments and methods, etc., can solve problems such as wafer secondary pollution, pollutant leakage, and affecting cleaning effects
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[0028] The technical solutions of the present invention will be described in detail below in conjunction with specific embodiments and accompanying drawings. The examples described here are specific implementations of the present invention and are used to illustrate the concept of the present invention; these descriptions are all explanatory and exemplary, and should not be construed as limiting the implementation of the present invention and the protection scope of the present invention . It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. In addition to the embodiments described here, those skilled in the art can also adopt other obvious technical solutions based on the claims of the application and the contents disclosed in the specification, and these technical solutions include adopting any modifications made to the embodiments described here. Obvious alternat...
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