Ag alloy sputtering target

A sputtering target and alloy technology, applied in sputtering coating, metal material coating process, vacuum evaporation coating, etc., can solve problems such as uneven color, poor appearance, discoloration, etc., and achieve sulfidation resistance and heat resistance Excellent performance and the effect of suppressing appearance defects

Pending Publication Date: 2022-02-25
MITSUBISHI MATERIALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] However, on the surface of an Ag alloy sputtering target made of an Ag alloy containing Ge and In, the reaction with the atmosphere gas proceeds unevenly, resulting in local discoloration, and color unevenness may occur
This kind of Ag alloy sputtering target with uneven color due to local discoloration may not be shipped as a product due to poor appearance

Method used

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  • Ag alloy sputtering target
  • Ag alloy sputtering target
  • Ag alloy sputtering target

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Experimental program
Comparison scheme
Effect test

Embodiment

[0102] Hereinafter, the results of the confirmation experiments performed in order to confirm the effectiveness of the present invention will be described.

[0103] The AG raw material was prepared from 99.99% by mass or more, and the Ag raw material was melted under a vacuum atmosphere. After the AR gas was replaced, GE and IN of the purity of 99.99% by mass or more were added, and the Ag alloy melter of the predetermined composition was melted. Further, the Ag alloy ingot was produced by casting the Ag alloy melt. Regarding the AG feedstock, the content of Pd, Pt, Au, and Rh is reduced as needed in the column of the invention.

[0104] (Composition composition)

[0105] Samples were collected from the obtained AG alloy ingot, and the composition composition and precious metal elements were determined according to ICP emission spectroscopy analysis. The component of the assay as an Ag alloy sputtering target is shown in Table 1.

[0106] The resulting Ag alloy ingot was performed...

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Abstract

This Ag alloy sputtering target comprises an Ag alloy that includes Ge and In, and the crystallite diameter thereof as derived by the Scherrer equation is 220 angstrom or less. The Ag alloy preferably has a composition containing In in a range of 0.1-1.5 mass% (inclusive) and Ge in a range of 0.1-7.5 mass% (inclusive), the balance being Ag and unavoidable impurities.

Description

Technical field [0001] The present invention relates to an Ag alloy sputtering target used when the film containing an Ag alloy comprising IN and GE. [0002] The present application claims priority to the Patent Application No. 20, 2004-094256, requested in Japanese May 29, 20020, and uses the content to be used here. Background technique [0003] Typically, since the optical characteristics and electrical characteristics of the AG film or the Ag alloy film are excellent, it is used as a reflective film and a conductive film such as a display or LED, such as a displacement or LED, and the like. [0004] For example, in Patent Document 1, a constituent material using an Ag alloy as a reflective electrode of an organic EL element is disclosed. [0005] In Patent Document 2, there is disclosed in the use of various Ag alloys as a reflective film provided in a light storage medium, a display or the like. [0006] In Patent Document 3, there is disclosed in reflective LCD reflective ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A99Z99/00
CPCC22C5/06C23C14/34C22F1/14C22F1/00C23C14/3414
Inventor 林雄二郎小见山昌三
Owner MITSUBISHI MATERIALS CORP
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