42results about How to "Excellent resistance to sulfuration" patented technology

Disclosed is a reflective film laminate, which has a pure Ag film or an Ag-based alloy film as a first layer on a base body, and an oxide film of a metal of one or more kinds selected from among Zr, Cr, Nb, Hf, Ta, V, Ni, Mo, W, Al and Si, as a second layer on the first layer. The thickness of the second layer is 0.1-10 nm, and deterioration of the reflection ratio of the reflective film laminate is 30 % or less by having the second layer provided therein. The reflective film laminate is provided with a protection film, which has a high initial reflection ratio, excellent sulfuration resistance and heat resistance, and an extremely small number of pin holes. As a result, the reflection ratio of the reflective film laminate is not easily deteriorated due to aggregation of Ag atoms of the Ag film.

A task of the invention is to provide an organic silicon resin composition which can sustain transparency and has excellent sulfidation resistance, a using method thereof, an organic silicon resin thereof, a structure comprising the organic silicon resin, and an optical semiconductor component sealing member. The task is settled through providing the organic silicon resin composition which comprises the following components: component (A): a polysiloxane which comprises at least two alkenyls that are combined with silicon atoms, component (B): a polysiloxane cross-linking agent which is provided with at least two SiH groups which is respectively obtained through combining a silicon atom and a hydrogen atom, component (C): a silane alkylation catalyst; and component (D): a zinc compound; wherein relatively to in total 100 by mass parts of component (A) and component (B), the organic silicon resin composition comprises 0.1-5 by mass parts of the component (D).

Disclosed is a silver plated or silver alloy plated article which has high productivity, high reflectance in the visible light range and excellent sulfuration resistance. Specifically disclosed is an electrolytically silver plated and / or electrolytically silver alloy plated article having an oxide layer on the surface, which is characterized in that a silver plating layer and / or a silver alloy plating layer is formed on a substrate by electrolytic silver plating and / or electrolytic silver alloy plating and then the resulting is subjected to an oxidation treatment so that an oxide layer is formed on the surface of the plating layer. It is preferable that the oxide layer formed on the surface of the plating layer has a film thickness of 0.05 micrometers or more.

To provide a substrate for mounting element having sulfurization resistance improved by increasing planarity of the surface of a thick conductor layer.The substrate 10 for mounting element of the present invention has such a structure that on a surface of a LTCC substrate or ceramics substrate as an inorganic insulating substrate 1, a thick conductor layer 2 is formed as an element connection terminal. The thick conductor layer 2 is made of a metal composed mainly of silver (Ag) or copper (Cu) and formed by printing and firing a metal paste. This thick conductor layer has its surface planarized by wet blast treatment to a surface roughness Ra of at most 0.02 μm. A Ni / Au-plated layer 3 is formed on the thick conductor layer 2, so that the surface of the thick conductor layer 2 is completely covered without any space.

An Ag-Pd-Cu-Ge silver alloy is disclosed which enables to form a reflective electrode film which has such two characteristics at the same time that decrease in the reflectance due to thermal deterioration is extremely small and yellowing due to sulfuration hardly occurs even after the heating step during production of color liquid crystal displays. The silver alloy is characterized by having a chemical composition composed of at least 4 elements wherein Ag is mainly contained, and 0.10-2.89 wt% of Pd, 0.10-2.89 wt% of Cu and 0.01-1.50 wt% of Ge are also contained such that the total content of Pd, Cu and Ge is 0.21-3.00 wt%.

The purpose of the present invention is to provide a silicone resin composition with excellent transparency and sulfuration resistance. Provided is a silicone resin composition comprising 0.01-5 parts by mass, per 100 parts by mass of a curable silicone resin compound (A), of a zinc compound (B) obtained by reacting 1.5 mol or more but less than 2 mol acid with 1 mol of at least one type selected from a group comprising zinc oxide, zinc carbonate, zinc hydroxide, zinc chloride, zinc sulfate, and zinc nitrate. Also provided is a method for using a silicone resin-containing structure, an optical semiconductor element sealed body, and the silicone resin composition, that use same.

The purpose of the present invention is to provide a silylated isocyanurate compound which can function as a metal anticorrosive agent having excellent heat resistance and vulcanization resistance, i.e., a silylated isocyanurate compound represented by general formula (1). In general formula (1), R independently represents a substituent selected from a hydrogen atom, an alkyl group having 1-10 carbon atoms, an alkenyl group having 2-10 carbon atoms, and a group represented by general formula (2-a) or general formula (2-b), and at least one R represents a general formula (2-b).

Provided is a ferritic stainless steel sheet for current collectors for sulfide-based solid-state batteries, which has excellent sulfidation resistance and adhesiveness. The ferritic stainless steel sheet has a component composition containing Cr in an amount of 16% by mass or more, wherein the surface of the ferritic stainless steel sheet has an uneven structure having recessed portions and projecting portions, the average height of the projecting portions is 20 to 50 nm inclusive, the average distance between the projecting portions is 20 to 200 nm inclusive, and the [Cr] / [Fe], i.e., the ratio of the atom concentration of Cr that is present in a form other than the metal form to the atom concentration of Fe that is present in a form other than the metal form, on the surface of the ferritic stainless steel sheet is 1.0 or more.

The invention provides a curable block organopolysiloxane composition and a semiconductor device to overcome the defect of poor cold and heat shock resistance in the prior art. The curable block organopolysiloxane composition has tensile strength of 1 to 8 Mpa, elongation at break of 50 to 200% and a refractive index of no less than 1.45 in a curing state under the conditions of a temperature of 25 DEG C and humidity of 60% RH. The composition comprises (A1) a block branched-chain-structured organopolysiloxane copolymer containing a R13SiO1 / 2 unit, a [R22SiO2 / 2]m unit and a [R3SiO3 / 2]n unit; (B1) straight-chain-structured polyorganohydrosiloxane, each molecule of which has at least one hydrogen atom bonding with silicon and at least one aromatic group on average; and (C) a hydrosilylation catalyst, wherein the amount of the hydrosilylation catalyst is sufficient to promote curing of the composition. Compared with the prior art, the curable block organopolysiloxane composition provided by the invention not only maintains good sulfuration resistance, a high refractive index and high hardness and has excellent cold and heat shock resistance.

The present invention provides an Ag alloy sputtering target by which it is possible to perform stable DC sputtering. This Ag alloy sputtering target contains 0.1-1.5 mass% In, the balance being a composition comprising Ag and unavoidable impurities, the concentration of oxygen being 50 mass ppm or less. In the entire area in the direction of thickness of the target, the proportion of area of a crushed void portion measured by an ultrasonic damage detection device is 1.0×10-4 or less in relation to the area of the sputtering surface.

The present invention provides a laminated film having a layer containing an infrared absorber that suppresses the generation of cracks and discoloration even in a high-humidity environment exposed to sunlight and is excellent in sulfuration resistance. The present invention is a laminated film having a substrate and an infrared absorbing layer, the infrared absorbing layer containing an infrared absorbing agent, a resin, and an antioxidant, and disposed on one surface of the substrate, wherein the The film surface pH of the surface of the infrared absorbing layer opposite to the substrate is 6.5 or higher.