Ag-based alloy target material and preparation method thereof

Abstract

The invention relates to an Ag-based alloy target material and a preparation method thereof. The Ag-based alloy target material is prepared from the following raw materials in percentage by mass: 74.90-84.95 wt% of Ag, 15-25 wt% of In + Sc and 0.05-0.15 wt% of doping elements, wherein the doping elements are selected from one or two of Ce, Pr, Zr, La and Nb. The preparation method of the Ag-based alloy target material comprises the steps of smelting and ingot casting, heating, rolling, heat treatment, shaping, machining, binding and the like. According to the novel Ag-based alloy target material, In and Sc are added into a silver base, the vulcanization resistance and heat resistance of silver-based alloy are effectively improved, meanwhile, the defects that the resistivity of a silver-based film is increased and the reflectivity is reduced due to the fact that the use amount of Sc is increased are overcome, and a synergistic effect exists between In and Sc; and on the basis, by adding other doping elements, the grain size can be further reduced, and the comprehensive performance of the target material is improved. Acquisition of the technical effects is a result of comprehensive action of a plurality of technical means such as a product formula and a preparation method.

Description

technical field [0001] The invention relates to a silver-based alloy, in particular to a silver-based alloy used for preparing a sputtering target. Background technique [0002] The target is the basic consumable in the magnetron sputtering process. Not only is it used in large quantities, but the quality of the target plays a crucial role in determining the performance of the film. Targets are widely used in a wide range of applications, mainly including optical targets, targets for display films, targets for semiconductors, targets for recording media, and superconducting targets. Among them, targets for the semiconductor field, targets for display and targets for recording media are currently the three most widely used targets. In order to improve the film preparation rate and ensure the growth quality of the film, the sputtering target must meet certain index requirements. In the prior art, the key factors controlling target quality are summarized as purity, density, s...

AI Technical Summary

Problems solved by technology

For example, Japanese patent document JP2003113433A discloses that when the sum of rare earth elements Sc, Y, Eu, Sm, Tb, Dy, Er and Yb in a silver-based alloy exceeds 2%, its resistivity increases and reflectivity decreases

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