Integrated structure of IGZO transistor and GaN HEMT grid control circuit and preparation method thereof
A technology of transistors and circuits, which is applied in the field of preparation of the above-mentioned integrated structures, can solve problems such as insufficient performance and excellent compound semiconductors, and achieve the effects of good thermal conductivity, saving and controlling power consumption, and enhancing heat dissipation
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Embodiment 1
[0048] (1) A thicker SiN layer 118 is grown on the substrate 101, and then etched in the corresponding GaN HEMT device position area to form a concave hole;
[0049] (2) On the basis of the above structure, the AlGaN buffer layer 102 is grown by metal-organic chemical vapor deposition;
[0050] (3) Unintentionally doping and growing a GaN buffer layer 103 on the basis of the above structure by metal-organic chemical vapor deposition method or other methods, with a thickness of 1 μm;
[0051] (4) The AlN layer 104 is formed by unintentional doping growth on the basis of the above structure by metal-organic source chemical vapor deposition;
[0052] (5) Using metal-organic source chemical vapor deposition method to form Al by unintentional doping and growth on the basis of the above structure 0.2 Ga 0.8 N layer 105;
[0053] (6) The AlGaN layer 106 is formed by unintentional doping and growth on the basis of the above structure by metal-organic source chemical vapor depositio...
Embodiment 2
[0069] The rest is the same as that of Embodiment 1, except that the thickness of the GaN buffer layer 103 in step (3) is 100 nm.
Embodiment 3
[0071] The rest is the same as that of Embodiment 1, except that the thickness of the GaN buffer layer 103 in step (3) is 10 um.
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