Resin composition, prepreg, laminated board and printed wiring board
A resin composition and prepreg technology, applied in printed circuits, printed circuit parts, layered products, etc., to achieve the effect of tight cross-linked structure, reduced dielectric constant and dielectric loss value, and increased cross-linked network structure
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preparation example Construction
[0041] Take the preparation of the active ester compound containing butadiene group as an example below, and its reaction mechanism is as follows:
[0042]
[0043] Of course, it is not limited to this, other methods can also be used to prepare active ester compounds as shown in structural formula (1) and structural formula (2), that is, all can be prepared as shown in structural formula (1) and structural formula (2) The preparation methods of the active ester compounds shown are all within the protection scope of the present invention.
[0044] Further, the epoxy resin is selected from bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S type epoxy resin, bisphenol E type epoxy resin, phosphorus-containing epoxy resin, nitrogen-containing epoxy resin Resin, o-cresol novolac epoxy resin, bisphenol A novolac epoxy resin, phenol novolac epoxy resin, cresol novolac epoxy resin, triphenylmethane epoxy resin, tetraphenylethane epoxy resin, biphenyl type Epoxy resin, n...
Synthetic example 1
[0105] Take butadienyl phenol resin and benzenedicarboxylic acid, stir and dissolve in toluene solvent evenly, at the temperature of 50°C, feed nitrogen at the same time, add tetrabutylammonium bromide catalyst, and then slowly drop in concentration 20% aqueous sodium hydroxide solution, reacted for 2.5 hours, then added phenol, continued to react for 1 hour, after the reaction was completed and washed several times, dried for 3 hours under vacuum at 80°C to obtain the active ester compound A, Wherein, the active ester compound A is an active ester compound shown in structural formula (1), and its chemical structural formula is as follows:
[0106]
Synthetic example 2
[0108] Take pentadienyl phenol resin and benzenedicarboxylic acid, stir and dissolve in toluene solvent evenly. 20% aqueous sodium hydroxide solution, reacted for 2.5 hours, then added p-vinylphenol, continued to react for 0.5 hours, after the reaction was completed and washed several times, dried under vacuum conditions at 80°C for 3 hours to obtain the active ester compound B, wherein, described active ester compound B is the active ester compound shown in structural formula (1), and its chemical structural formula is as follows:
[0109]
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