Method for controllably preparing semiconductor single-walled carbon nanotubes by combining high-throughput screening and machine learning
A single-walled carbon nanotube, semiconducting technology, applied in the field of high-throughput screening and machine learning combined with controllable preparation of semiconducting single-walled carbon nanotubes, can solve the problem of low efficiency, time-consuming semiconducting single-walled carbon nanotubes, Inaccurate and other issues, to speed up design, reduce research time and energy consumption, and standardize the effect of preparation
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Embodiment 1
[0045] In this example, the method for the controllable preparation of semiconducting single-walled carbon nanotubes by combining high-throughput screening and machine learning is as follows:
[0046] First, 64 kinds of discrete cobalt / platinum / molybdenum catalyst thin film arrays were prepared on digitally marked silicon wafers by using a combined mask to assist ion beam deposition, and the thickness range of cobalt / platinum / molybdenum catalyst thin film arrays was 0~0.9nm (excluding 0, the thickness interval is 0.1nm), the coating process see figure 1 , coating thickness and mask rotation sequence are shown in Table 1, and the cobalt / platinum / molybdenum catalyst film array prepared is shown in figure 2 (a). The growth process is as follows: first, oxidize the cobalt / platinum / molybdenum catalyst array sample at 500°C for 10 minutes in an air atmosphere, and push the sample out of the high-temperature zone; secondly, raise the temperature of the tube furnace to 850°C, After...
Embodiment 2
[0049] In this example, the method for the controllable preparation of semiconducting single-walled carbon nanotubes by combining high-throughput screening and machine learning is as follows:
[0050] First, 64 kinds of discrete cobalt / platinum / molybdenum catalyst thin film arrays were prepared on digitally marked silicon wafers by using a combined mask to assist ion beam deposition, and the thickness range of cobalt / platinum / molybdenum catalyst thin film arrays was 0~0.9nm (excluding 0, the thickness interval is 0.1nm), the coating process see figure 1 , coating thickness and mask rotation sequence are shown in Table 1, and the cobalt / platinum / molybdenum catalyst film array prepared is shown in figure 2(a). The growth process is as follows: first, oxidize the cobalt / platinum / molybdenum catalyst array sample at 500°C for 10 minutes in an air atmosphere, and push the sample out of the high-temperature zone; secondly, raise the temperature of the tube furnace to 875°C, After ...
Embodiment 3
[0053] In this example, the method for the controllable preparation of semiconducting single-walled carbon nanotubes by combining high-throughput screening and machine learning is as follows:
[0054] First, 64 kinds of discrete cobalt / platinum / molybdenum catalyst thin film arrays were prepared on digitally marked silicon wafers by using a combined mask to assist ion beam deposition, and the thickness range of cobalt / platinum / molybdenum catalyst thin film arrays was 0~0.9nm (excluding 0, the thickness interval is 0.1nm), the coating process see figure 1 , coating thickness and mask rotation sequence are shown in Table 1, and the cobalt / platinum / molybdenum catalyst film array prepared is shown in figure 2 (a). The growth process is as follows: first, oxidize the cobalt / platinum / molybdenum catalyst array sample at 500°C for 10 minutes in an air atmosphere, and push the sample out of the high-temperature zone; secondly, raise the temperature of the tube furnace to 900°C, After...
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