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Initiator-free quantum dot ultraviolet curing resin

An initiator-free, resin-curing technology, applied in the field of quantum dot UV-curable resin, can solve problems such as inability to match quantum dots, high cost of quantum dot films, and poor compatibility of oligomers, so as to improve product stability and enhance Compatibility, the effect of improving compatibility

Pending Publication Date: 2022-03-29
NINGBO DXC NEW MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Industrially synthesized quantum dots are generally synthesized by metal-organic methods in high-boiling solvents, and the surface ligands are generally less polar oleylamine, etc., and oligomer phases in UV-curable resins with high adhesion. Poor capacitance
The initiators of UV-curable resins, such as TOPL He 184, are very polar and cannot be well matched with quantum dots. Generally, quantum dot glue manufacturers use self-developed special structured photoinitiators to initiate glue polymerization, and the cost is high.
[0004] At present, there are different degrees of compatibility problems between high adhesion resins, common photoinitiators and quantum dots, and the production of quantum dot films has high cost and poor stability.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Embodiment 1, a quantum dot ultraviolet curable resin without an initiator is characterized in that it consists of the following components in parts by weight:

[0022] 50 parts of high adhesion oligomer;

[0023] Dilute monomer 35 parts;

[0024] 1.5 parts of light diffusing particles;

[0025] 1 quantum dot;

[0026] Dithioacrylate monomer ADSDA 10 parts;

[0027] The molecular formula of the dithioacrylate monomer ADSDA is shown in the following formula:

[0028] .

[0029] In this embodiment, the high adhesion oligomer is an aliphatic acrylate oligomer produced by Guangzhou Runao Chemical Materials Co., Ltd. with a model number of FS2651;

[0030] In this embodiment, the diluting monomer is hexanediol diacrylate.

[0031] The light-diffusing particles are used to refract light, and light-diffusing particles commonly used in this field can be used, and details will not be repeated here.

Embodiment 2

[0032] Embodiment 2, a quantum dot ultraviolet curing resin without an initiator, is characterized in that it consists of the following components in parts by weight:

[0033] 55 parts of high adhesion oligomer;

[0034] Dilute monomer 30 parts;

[0035] 2 parts of light diffusing particles;

[0036] 0.5 parts of quantum dots;

[0037] Dithioacrylate monomer ADSDA 5 parts;

[0038] The molecular formula of the dithioacrylate monomer ADSDA is shown in the following formula:

[0039] .

[0040] In the present embodiment, described high adhesion oligomer is the model that Sartomer (Guangzhou) Chemical Co., Ltd. produces is the aliphatic urethane acrylate of CN8000 NS;

[0041] In this embodiment, the diluting monomer is 2-phenoxyethyl acrylate.

[0042] The light-diffusing particles are used to refract light, and light-diffusing particles commonly used in this field can be used, and details will not be repeated here.

Embodiment 3

[0043] Embodiment three, an initiator-free quantum dot ultraviolet curing resin is characterized in that it consists of the following components in parts by weight:

[0044] 40 parts of high adhesion oligomer;

[0045] Dilute monomer 37 parts;

[0046] 1 part of light diffusing particles;

[0047] 0.1 parts of quantum dots;

[0048] Dithioacrylate monomer ADSDA 20 parts;

[0049] The molecular formula of the dithioacrylate monomer ADSDA is shown in the following formula:

[0050] .

[0051] In the present embodiment, the high adhesion oligomer is the aliphatic urethane acrylate of CN8007 NS produced by Sartomer (Guangzhou) Chemical Co., Ltd.;

[0052] In this embodiment, the diluting monomer is isobornyl acrylate.

[0053] The light-diffusing particles are used to refract light, and light-diffusing particles commonly used in this field can be used, and details will not be repeated here.

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PUM

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Abstract

The invention relates to initiator-free quantum dot ultraviolet curing resin, which is prepared from the following components in parts by weight: 40 to 60 parts of high-adhesion oligomer; 30-40 parts of a diluting monomer; 1-2 parts of light diffusion particles; 0.1 to 2 parts of quantum dots; 2 to 20 parts of a dithioacrylate monomer ADSD; the dithioacrylate monomer ADSDA can absorb the energy of ultraviolet light to generate sulfur free radicals, by adding dithioacrylate into the high-adhesion resin, the use of a photoinitiator is avoided, the cost is reduced, the sulfur free radicals are more stable than oxygen, the resin can be cured in the presence of air, and the conversion rate of curing reaction is higher. Lone pair electrons of a disulfide bond of the dithioacrylate monomer ADSDA can generate a relatively strong coordination effect with metal atoms on the surfaces of the quantum dots, so that the compatibility of the quantum dots and resin can be improved. The dithioacrylate monomer ADSDA is introduced into the quantum dot ultraviolet curing resin, so that the high adhesive force of the resin and a barrier film can be ensured, the compatibility of quantum dots and the resin is improved, and the product stability is improved.

Description

technical field [0001] The invention relates to a quantum dot ultraviolet curing resin. Background technique [0002] Quantum dot film is an optical film that can significantly improve the color gamut of LCD display devices. At present, the quantum dot layer of quantum dot film is mainly composed of UV curable resin. In order to improve the stability of quantum dots in the quantum dot film, a high adhesion resin and a barrier film are generally required to block water and oxygen, and a photoinitiator is used to initiate the curing process of the UV resin. The performance of the high adhesion resin is basically determined by the oligomers in the resin composition. The oligomers in the resin must have a certain polarity. The barrier film falls off over time. [0003] Industrially synthesized quantum dots are generally synthesized by metal-organic methods in high-boiling solvents, and the surface ligands are generally less polar oleylamine, etc., and oligomer phases in UV-cur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F265/06C08F283/00C08F283/01C08F222/24C08F222/14C08F220/30C08F220/18C08F2/48
CPCC08F265/06C08F2/48C08F283/008C08F283/01C08F222/102C08F220/301C08F220/1811
Inventor 罗培栋白倩倩卞高科赵程
Owner NINGBO DXC NEW MATERIAL TECH
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