High-productivity vertical furnace

Abstract

The invention discloses a high-productivity vertical furnace which comprises a furnace body, a gas supply system, a vacuum system, a vertical loading mechanism, an internal heating part, a process pipe, a carrier boat and a heat insulation supporting assembly, wherein the internal heating part, the process pipe, the carrier boat and the heat insulation supporting assembly are installed in the furnace body. The furnace body is of a vertical furnace structure, a furnace door assembly is arranged on the furnace body, and the vertical loading mechanism is used for being connected with the furnace door assembly and used for opening, closing and sealing a furnace door in the furnace door assembly. The carrier boat is arranged on the heat insulation supporting assembly; the gas supply system is used for providing gas required by an equipment technological process into the furnace body; the vacuum system is used for providing a vacuum atmosphere in the furnace body; more than two groups of carrier boats are provided and are used for placing slide glass. The method has the advantages of being simple in principle, easy and convenient to operate, capable of improving the production capacity of equipment and improving the yield of battery pieces and the like.

Description

technical field [0001] The invention mainly relates to the technical fields of semiconductor and photovoltaic manufacturing, and in particular refers to a high-capacity vertical furnace. Background technique [0002] In the field of semiconductor and photovoltaic manufacturing, vertical furnaces are widely used, and are widely used in the production of oxidation, annealing, doping, coating and other processes on slides. For example, the current vertical furnace used in the semiconductor industry generally only loads a carrier boat, the constant temperature zone is short, the loading capacity is generally 25-50 pieces, the maximum is 100 pieces, and the production capacity is limited; while the current oxidation, annealing, doping Large-scale production of miscellaneous, coating and other processes uses a horizontal furnace structure. [0003] When silicon wafers complete the battery manufacturing process in horizontal tubular coating equipment such as horizontal diffusion f...

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Problems solved by technology

[0003] When silicon wafers complete the battery manufacturing process in horizontal tubular coating equipment such as horizontal diffusion furnace, horizontal PECVD, horizontal LPCVD, etc., the center line of the silicon wafer and the horizontal furnace body along the length direction is vertical, and the silicon wafer At least one side needs to be fixed by stuck points or wires, which will cause process problems such as stuck points dirty, stuck points burnt, etc., which will eventually reduce the yield index of the cell

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