Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Auxiliary implantation device of high-flux flexible electrode and assembling method

A technology of flexible electrodes and implant devices, which is applied in the field of brain function detection, can solve problems such as unequal spacing, improper assembly position of flexible electrodes, and affecting implantation effects, so as to reduce difficulty, reduce photolithography time and difficulty, and avoid brain damage. Effects of Tissue Trauma

Pending Publication Date: 2022-04-01
SHANGHAI NEURO XESS TECH CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Solve the problem in the prior art that the flexible electrode assembly position is improper due to non-parallel or unequal spacing of the tungsten wires, which affects the implantation effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Auxiliary implantation device of high-flux flexible electrode and assembling method
  • Auxiliary implantation device of high-flux flexible electrode and assembling method
  • Auxiliary implantation device of high-flux flexible electrode and assembling method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0046] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0047] It should be noted that the terms "comprising" and "having" and any variations thereof are intended to cover a non-exclusive inclusion, for example, a process, method, system, product or device comprising a series of steps or units is not necessarily limited to expressly instead of those steps or elements listed, may include other steps or elements not explicitly listed or inherent to the process, method, product or apparatus.

[0048] Such as Figure ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an auxiliary implantation device of a high-flux flexible electrode and an assembling method, and the auxiliary implantation device is used for assisting the flexible electrode to be inserted into the brain of an organism, and comprises a plurality of tungsten filaments which are used for fixing exposed electrodes of the flexible electrode in a one-to-one correspondence manner; the two-photon mold is a mold which is formed through two-photon printing and is provided with a plurality of opening grooves which are arranged in parallel at equal intervals, the opening grooves are used for placing tungsten filaments, and the distance between the opening grooves is equal to the distance between the exposed electrodes of the flexible electrode; the width of the opening groove is matched with the width of the tungsten filament, and the length of the opening groove is smaller than that of the tungsten filament. By arranging the two-photon mold, the tungsten filaments can be distributed on the two-photon mold in parallel at equal intervals, the flexible electrodes can be conveniently fixed to the tungsten filaments at equal intervals, and the implanting effect of the flexible electrodes is effectively guaranteed; the problem that in the prior art, due to the fact that tungsten filaments are not parallel or the intervals are not equal, the implanting effect is affected is solved.

Description

technical field [0001] The invention relates to the technical field of brain function detection, in particular to an auxiliary implantation device and an assembly method of a high-throughput flexible electrode. Background technique [0002] Neuro-electrophysiological monitoring plays an irreplaceable role in brain science research and brain disease diagnosis. High-quality neuro-electrophysiological signal acquisition technology is the basis for the smooth development of basic research on brain science and clinical research on brain diseases in China. [0003] The method of collecting neurophysiological signals mainly depends on the brain-computer interface. According to the way of information collection, it is usually divided into two types: implantable and non-implantable. Among them, non-implantable electrodes generally refer to EEG, which can Non-invasively observe and record brain activity, usually in the form of an electrode cap, by collecting and recording signals from...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61B5/294A61B5/00H01B13/00
Inventor 彭雷谭正
Owner SHANGHAI NEURO XESS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com