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System and method for detecting trace impurities in high-purity trichlorosilane

A technology of high-purity trichlorosilane and trace impurities, applied in measuring devices, material analysis through electromagnetic means, instruments, etc., can solve the problems of poor airtightness in the detection process, external interference, and low detection accuracy, and achieve airtightness Good, reduce calculation error, high detection accuracy

Inactive Publication Date: 2022-04-01
江苏鑫华半导体科技股份有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the current method for detecting trace impurities in trichlorosilane has problems such as low detection accuracy, poor airtightness of the detection link, and easy to be interfered by the outside world.
Therefore, the existing methods for detecting trace impurities in trichlorosilane still need to be further improved

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  • System and method for detecting trace impurities in high-purity trichlorosilane

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Embodiment Construction

[0024] Embodiments of the present invention will be described in detail below. The embodiments described below are exemplary and is intended to illustrate the invention, and cannot be understood to limit the invention. In an embodiment, specific techniques or conditions are not specifically described, and the techniques or conditions described in the art or according to the product specification. The reagents or instruments used are not indicated by the manufacturer, all of which can be obtained through the market.

[0025] In one aspect of the invention, the present invention proposes a system for detecting trace impurities in high purity trichloride, and an embodiment of the present invention figure 1 The system includes: PFA bottle 100, the PFA bottle 100 includes a soft plug that seals the PFA bottle 100, and the PFA bottle 100 is adapted to accommodate hydrofluoric acid and nitric acid mixture; sampling Apparatus, the sample device includes a sampling tube 200, and one end of...

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Abstract

The invention discloses a system and a method for detecting trace impurities in high-purity trichlorosilane. The system comprises a PFA bottle, the PFA bottle comprises a soft plug, the soft plug is suitable for sealing the PFA bottle, and the PFA bottle is suitable for containing a mixed solution of hydrofluoric acid and nitric acid; the sampling device comprises a sampling pipe, one end of the sampling pipe is connected with the first PFA needle head, the other end of the sampling pipe is connected with the trichlorosilane pipeline, a valve and a flow control meter are arranged on the sampling pipe, and the valve is suitable for controlling connection and disconnection of the sampling device and the trichlorosilane pipeline; the flow control meter is connected with the air extracting pump and is suitable for controlling the volume of a trichlorosilane sample extracted in a single time; the first PFA needle is suitable for puncturing the soft plug and stretching below the liquid level of the PFA bottle to enable the extracted trichlorosilane sample to react with the mixed liquid; the pipettor comprises a second PFA needle head, and the pipettor is suitable for piercing the soft plug through the second PFA needle head and extending into the PFA bottle to transfer the reaction liquid to the testing device. The system is high in detection precision, good in detection result accuracy and reliability, and not easy to cause external interference.

Description

Technical field [0001] The present invention relates to the field of trichloride detection, and in particular, to systems and methods for detecting trace impurities in high purity trichlorosilicon. Background technique [0002] The detection and analysis of trace impurities in trichlorosilicon is the key to preparing high purity trichloride. However, the method of currently detecting trace impurities in trichlorosilicon has a low detection accuracy, poor detection loop, and is easy to suffer from external interference. Thus, the conventional method of detecting trace impurities in trichloride remains to be further improved. Inventive content [0003] This application is mainly based on the following issues and discovery: [0004] At present, the test method of trace impurities in trichlorosilicon mainly has two, one is to use crystallization method, prepared polycrystalline silicon rod with trichloromenel, and then test the impurity content in the silicon rod, but the intermedia...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/626G01N1/14
Inventor 张天雨蒋文武闫家强吴鹏
Owner 江苏鑫华半导体科技股份有限公司
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