93 results about "Trichlorohydrin" patented technology

The invention discloses a catalyst for preparing trichlorosilane and a catalytic preparation method of trichlorosilane. The catalyst is prepared from the following components in percentage by mass: weighed copper nitrate, zinc nitrate, aluminum nitrate, lanthanum nitrate and the balance of a carrier, the preparation method comprises the following specific steps: S1, filling a catalyst; S2, purifying raw material gas; S3, reacting; and S4, separating and purifying a product, namely discharging a reacted gas product from an outlet of a reactor, and condensing through a condenser. In the prepared catalyst, the activity and selectivity of the catalyst are remarkably improved through the synergistic effect of the copper-zinc-aluminum composite oxide and the rare earth element lanthanum, the electronic structure and the surface acid-base property of the catalyst can be adjusted through doping of lanthanum, the reaction of silicon powder and hydrogen chloride is promoted, meanwhile, side reactions are inhibited, and the service life of the catalyst is prolonged. And the yield of trichlorosilane is improved.

The invention relates to the technical field of chemical engineering, and discloses a trichlorosilane hydrogen reduction polycrystalline silicon growth monitoring system fusing multi-source data. Comprising a multi-sensor monitoring module, a multi-sensor data acquisition module, a multi-source data preprocessing module, a growth process data analysis module, a growth state online evaluation module, a process parameter online regulation and control module, a regulation and control result feedback module and a system collaborative management module, the multi-sensor monitoring module monitors the growth process of trichlorosilane hydrogen reduction polycrystalline silicon through multiple sensors, the multi-sensor data acquisition module acquires original data, the multi-source data preprocessing module preprocesses the data, the growth process data analysis module carries out data calculation, and the growth state online evaluation module carries out online comprehensive evaluation. The process parameter online regulation and control module regulates and controls process parameters online, the regulation and control result feedback module generates an adjustment strategy, and the system collaborative management module performs system parameter recording and storage, system optimization and exception handling.

The invention discloses a low-expansion silicon-carbon negative electrode material and a preparation method thereof, and belongs to the technical field of secondary batteries. The invention relates to a preparation method of a low-expansion silicon-carbon negative electrode material. The preparation method comprises the following steps: S1, depositing SiO2: depositing porous carbon for the first time by adopting silane with at least two ethyoxyl groups or methoxyl groups; then calcining to obtain a SiO2 deposition layer; s2, silicon deposition: carrying out secondary deposition on the material obtained in the step S1 by adopting monosilane, disilane and / or trichlorosilane; and S3, carbon coating: carrying out carbon coating on the material obtained in the step S2 by using a carbon source gas. According to the low-expansion silicon-carbon negative electrode material disclosed by the invention, porous carbon is firstly subjected to deposition modification by utilizing SiO2 deposition, so that the overall structural strength of a framework is improved; after silane deposition, silicon of the second deposition layer and silicon dioxide of the first deposition layer can react to generate SiO, and volume expansion of silicon crystal grains can be relieved.

The invention discloses a slow-start pneumatic switch valve device for trichlorosilane feeding, and belongs to the technical field of material preparation process valves. Comprising a switch valve and a pneumatic actuator, linear motion of a piston rod is converted into rotation fine adjustment through a swing arm rotation compensation mechanism, a solid / microgroove sealing ring and a sliding cavity wall are always kept on a theoretical contact line, abrasion microgaps are automatically compensated, zero-clearance sliding in the whole life cycle is achieved, and manual clearance adjustment is avoided; the solid sealing ring adopts surface-surface contact, so that the unit pressure is reduced by more than 50%, and the wear rate is obviously reduced; the omega-shaped groove of the microgroove sealing ring converts solid particles (10-50 microns Si) into groove edge elastic sealing, and the wear rate is reduced by 40% again; a sealing surface is provided with a uniform oil film, the dynamic and static friction coefficient difference is reduced, crawling / jumping in a 0-20% opening low-speed stage is eliminated, true slow starting is achieved, the water hammer effect during trichlorosilane feeding is avoided, the sealing surface is provided with the uniform oil film, the dynamic and static friction coefficient difference is reduced, and crawling / jumping in the 0-20% opening low-speed stage is eliminated.

The invention provides a preparation method of bis-[3-(triethoxysilyl) propyl]-disulfide. The preparation method comprises the following steps: S1, under the protection of nitrogen, dropwise adding chloropropene and trichlorosilane into a non-polar solvent, a first catalyst and tripropylamine, reacting at room temperature, taking filtrate, dropwise adding the filtrate into alcohol in a micro-reflux state, reacting, adding a sodium alkoxide / alcohol solution for neutralizing, filtering, and distilling to obtain allyltriethoxysilane; and S2, under ultraviolet light, mixing allyltriethoxysilane, mercaptopropyltriethoxysilane and benzoin dimethyl ether, reacting at room temperature for 2-3 hours, adding sulfur and a second catalyst, carrying out heating reaction, removing low boiling points, cooling, and filtering. According to the preparation method provided by the invention, bis-[3-(triethoxysilyl) propyl]-disulfide is successfully and effectively synthesized, a phase transfer catalyst does not need to be introduced for catalysis, hydrolysis of silane and treatment of saline water are reduced, the yield of single-kettle synthesis is high, and the utilization rate of equipment is high.

The application discloses a kind of feed dynamic regulation methods of synthesizing trichlorosilane, through multispectral synergistic detection, through the accurate calculation of key parameters such as hydroxyl inhibition factor, amorphous phase activity gain and metal impurity inhibition factor, the activity condition of silicon powder in fluidized bed can be accurately and real-time reflected, the technical bottleneck that silicon powder activity cannot be monitored on line is broken through, and then in industrial production, for the proportion of fluidized bed feed etc. Real-time regulation provides control basis.Through feed dynamic regulation mechanism, silicon powder feed rate, H2 / SiCl4 ratio and catalyst addition amount can be optimized in real time, ensure that silicon powder is always in high activity state, promote the reaction to proceed, improve trichlorosilane yield and purity, solve the problem that traditional fixed regulation mode and silicon powder dynamic activity do not match, and then improve regulation accuracy.

The utility model discloses a polycrystalline silicon reduction feeding system which comprises two sets of feeding systems arranged in parallel, liquid outlets of two trichlorosilane buffer tanks of the two sets of feeding systems are communicated through a buffer tank communication pipeline, and a buffer tank communication valve is arranged on the buffer tank communication pipeline; gas outlets of the two vaporizers of the two feeding systems are communicated through a vaporizer communicating pipeline, and a vaporizer communicating valve is arranged on the vaporizer communicating pipeline; outlets of the two superheaters of the two feeding systems are communicated through a superheater communication pipeline, and a superheater communication valve is arranged on the superheater communication pipeline. The feeding system has the advantages that the two original independent feeding systems are communicated, when one feeding system breaks down or needs to be overhauled, the other feeding system can be rapidly switched to supply materials to the whole production line, material communication between the feeding systems on the two sides is achieved, continuous production can be guaranteed, and the production efficiency is improved. The stop frequency caused by equipment faults is effectively reduced, and the stability and continuity of production are greatly improved.

The invention relates to a method and a system for preparing trichlorosilane from ferrosilicon, the method comprises the following steps: taking ferrosilicon, silicon tetrachloride and hydrogen as raw materials, fully reacting in a fluidized bed reactor to obtain trichlorosilane and FeSiy alloy, xlt; 40). The system comprises a fluidized bed reactor (200), a cyclone separator (300), a washing tower (400), a gas-liquid separator (500) and a coarse distillation tower (600). Compared with the prior art, the method has the remarkable characteristics that the silazite is used as a silicon source and is low in cost and easy to obtain, the reaction activity of trichlorosilane and FeSiy generated by reaction of the silazite, silicon tetrachloride and hydrogen is high, the utilization rate of silicon elements in the compound is high, no extra catalyst needs to be added in the co-hydrogenation reaction, meanwhile, the byproduct FeSiy alloy is produced, and the production cost is low.

The invention provides a method for recovering tail gas generated in production of carbon nanotubes. The method comprises the following steps: compression: introducing tail gas containing methane and hydrogen into a compressor for pressurization; first-stage separation: the pressurized tail gas is introduced into a first-stage membrane separator for separation, methane and first-stage tail gas are obtained, and the main component of the first-stage tail gas is hydrogen; and second-stage separation: introducing the first-stage tail gas into a second-stage membrane separator for separation to obtain hydrogen and second-stage tail gas containing hydrogen. Through two-stage membrane separation, methane and hydrogen are recovered, the methane separated in the first stage can return to the continuous furnace to be continuously used as a raw material for producing carbon nanotubes, and the hydrogen separated in the second stage can be used for producing trichlorosilane, so that the recovery and utilization of resources can be realized.

The invention discloses a trichlorosilane deep rectification composite impurity removal process, and belongs to the technical field of polycrystalline silicon production raw material purification. According to the process, deep purification of crude trichlorosilane is achieved through the steps of pre-protection and primary adsorption, directional rectification enrichment of methyl dichlorosilane narrow fractions, concentration, mixing with silicon tetrachloride, catalytic reaction rectification conversion, differential pressure thermal coupling rectification purification, double-tank parallel deep purification, tail gas treatment and the like. According to the method, the impurity methyl dichlorosilane difficult to remove is precisely separated through side extraction, the impurity methyl dichlorosilane is converted into a component easy to separate through a catalytic reaction, and the boron and phosphorus impurities are deeply removed in combination with differential pressure thermal coupling energy saving and double-tank alternate adsorption. The process can efficiently remove moisture, metals and key impurities boron and phosphorus, obviously improves the purity of the trichlorosilane product, realizes gradient utilization of energy and hydrogen circulation, and has the advantages of high purity, low energy consumption and continuous production.

This invention provides an activation method for a liquid fatty amine, a preparation process for the liquid fatty amine and silane, wherein the liquid fatty amine has a tertiary amine group; the activation method involves activating the liquid fatty amine with silicon tetrachloride; this method can significantly improve the catalytic effect of the liquid fatty amine, and the activated liquid fatty amine exhibits higher catalytic activity in the process of disproportionation of trichlorosilane to prepare silane, which can effectively reduce the reaction activation energy, increase the reaction rate, and improve the single-pass reaction efficiency and conversion rate.

The present application relates to a kind of preparation methods of thin layer high resistance silicon epitaxial wafer for photomultiplier tube device, by before the silicon substrate piece is mounted, design and carry out etching and polycrystalline silicon coating layer cycle cleaning process to reaction cavity and graphite base multiple hydrogen chloride gas, the growth environment of reaction cavity is purified, and by accurately adjusting the flow of process hydrogen, the flow of trichlorosilane, the temperature process parameter of silicon epitaxial layer reaction growth in the process of silicon epitaxial layer growth, the growth rate of silicon epitaxial layer is significantly reduced, to extend the reaction process of thin layer silicon epitaxial layer, expand the proportion of steady-state growth phase, realize the high uniformity distribution of thin layer high resistance silicon epitaxial layer, finally obtain a kind of preparation method of thin layer high resistance silicon epitaxial layer, the thickness of silicon epitaxial layer is in 1 μm order of magnitude, process is simple, strong compatibility, greatly improve production efficiency, save production cost, suitable for industrialized continuous production, meet the production order delivery requirements of thin layer high resistance silicon epitaxial wafer for photomultiplier tube device.

The application discloses a silicon powder recovery process in a cold hydrogenation process and a trichlorosilane synthesis process. The silicon powder recovery process in the cold hydrogenation process comprises the following steps: (1) after the residual material of the cold hydrogenation process is subjected to static pressure, a silicon powder mixture containing chlorosilane and a small amount of high-boiling substances is obtained; (2) the silicon powder mixture is dried to obtain silicon residue; (3) after the silicon residue is subjected to neutral high-salt water hydrolysis, solid-liquid separation is performed to obtain solid silicon residue; and (4) the solid silicon residue is subjected to drying and physical screening to remove iron impurities. The silicon powder recovery process in the cold hydrogenation process and the trichlorosilane synthesis process solve the problem of reaction between liquid alkali and silicon powder, improve the silicon content, reduce the content of silicon dioxide impurities, thereby about 60-70% of effective silicon residue in the cold hydrogenation residue slurry is recovered, the silicon residue can be sent to trichlorosilane synthesis, or the silicon residue is mixed with dead ash and then sent to trichlorosilane synthesis, the environmental protection pressure is reduced, and the cost is greatly reduced.

The utility model relates to the technical field of chemical gas recovery, and provides a device for separating trichlorosilane tail gas and co-producing fumed silica, which adopts a combined process to treat the trichlorosilane tail gas and is provided with a rectification separation seat provided with a low-temperature cold energy recovery mechanism. Hydrogen, hydrogen chloride and chlorosilane in the tail gas are separated step by step through the rectification separation assembly, the hydrogen chloride and the chlorosilane are directly conveyed to the combustion assembly, the purity of the hydrogen chloride is recycled to the trichlorosilane tail gas treatment assembly, recycling after separation is achieved, and the purposes of further saving energy consumption and improving the purity are achieved; a fumed silica combustion furnace suitable for low-boiling-point chlorosilane is adopted, so that the chlorosilane and hydrogen are mixed and combusted to generate fumed silica and hydrogen chloride, and the fumed silica can be directly discharged through a fumed silica discharge pipe; and the generated hydrogen chloride is recovered into the trichlorosilane tail gas treatment seat through a second hydrogen chloride return pipe, and closed-loop utilization is realized.

The application discloses a device for producing high-purity silane from trichlorosilane, which comprises a reaction rectifying tower, an auxiliary reaction system, a multistage condensing system, a booster pump and a rectifying system; the side line of the reaction rectifying tower is connected with the auxiliary reaction system; the feed inlet of the multistage condensing system is connected with the top of the reaction rectifying tower, and the liquid phase discharge port of the multistage condensing system is connected with the reaction rectifying tower; the discharge port of the multistage condensing system is connected with the feed inlet of the booster pump, and the discharge port of the booster pump is connected with the rectifying system; and the application further discloses a method for producing high-purity silane by using the device. The device has the advantages of low energy consumption, high reaction efficiency, safety and environmental protection, and high product purity.

The application provides a device and a method for preparing trichlorosilane, and the device comprises a trichlorosilane synthesis system, a dry dust removal system, a wet dust removal system, a heavy component removal and purification system and a slag slurry treatment system; the trichlorosilane synthesis system comprises a trichlorosilane reactor; the dry dust removal system comprises a cyclone separator; the wet dust removal system comprises a spray tower, a reboiler, a heat exchanger and a first condenser; and the heavy component removal and purification system comprises a heavy component removal tower and a carbon adsorption tower. The device combines the pneumatic conveying of silicon powder in the entire polysilicon industry, and combines the energy-saving technology of condensing mixed gas as the liquid phase of spray washing by using the heat exchanger, the energy-saving means of bidirectional extraction of trichlorosilane and tetrachlorosilane components, and the technology of slag slurry concentration and recovery, so that the effective resource integration of the entire system is achieved, the technical effects of low energy consumption and cyclic reuse are fully realized, and a high-purity trichlorosilane production system which can run independently and self-compensate is created.

The application provides a method for absorbing hydrogen chloride in hydrogen gas in polysilicon production hydrogen recovery by using trichlorosilane, comprising the following steps: after cooling compression and chlorosilane separation treatment, the reduction tail gas enters an absorption tower, trichlorosilane is used as an absorbent in the absorption tower to absorb hydrogen chloride in hydrogen gas under high-pressure and low-temperature conditions, high-purity hydrogen gas is generated at the top of the absorption tower, and rich liquid is generated at the bottom of the absorption tower; the rich liquid is sent into a desorption tower to carry out desorption under low-pressure and high-temperature conditions, high-purity hydrogen chloride is generated at the top of the desorption tower, and regenerated lean liquid is generated at the bottom of the desorption tower; and the regenerated lean liquid is mixed with fresh supplemented trichlorosilane after cooling and then returned to the absorption tower to form a cycle.

This invention discloses a process for the cold hydrogenation of silicon tetrachloride to produce trichlorosilane. Silicon tetrachloride and hydrogen are fed into a bubbling slurry bed reactor for catalytic cold hydrogenation. The bubbling slurry bed reactor uses molten salt as a medium and metal chloride as a catalyst, operating at a temperature of 450–500°C and a reaction pressure of 2.5–4.0 MPaG. This invention features a simple process, meets the requirements for large-scale and continuous production, and boasts low investment, low operating costs, and high safety and reliability. The silicon tetrachloride conversion rate and process flow are simple, and the reactor investment is significantly lower than existing cold hydrogenation reactors, solving the problems of high equipment investment and low reaction conversion rates in existing cold hydrogenation processes.

The utility model provides a preparation device of electronic-grade silane. According to the preparation device, a first disproportionation reaction is carried out on the basis of the first reactor, dichlorosilane is rectified and separated to serve as a raw material for a second disproportionation reaction, silane can be obtained on the basis of cheap trichlorosilane and a catalytic reagent, and electronic-grade silane can be obtained on the basis of traditional purification after rectification; based on heat exchange between tower top materials of the rectifying tower I and a tower kettle reboiler of the rectifying tower II, differential pressure thermal coupling integration is realized, condensing equipment and operation steps can be omitted, energy consumption is reduced, and the defects of high preparation cost and high energy consumption of a silane preparation device in the prior art are overcome.

The application discloses a preparation method of long-chain alkyl green silane coupling agent, comprising the following steps: step one, 10-undecene-1-ol is reacted with chlorosulfoxide under the conditions of low-temperature dropwise adding and medium-temperature preservation, and 11-chloro-1-undecene is obtained through vacuum rectification purification; step two, under the action of a platinum catalyst, 11-chloro-1-undecene is subjected to addition reaction with trichlorosilane, excessive raw materials are removed, and 11-chloro undecyl trichlorosilane is obtained through rectification; step three, 11-chloro undecyl trichlorosilane is subjected to alkoxylation reaction with biological methanol or biological ethanol, by-products and excessive biological alcohol are removed, and high-purity long-chain alkyl green silane coupling agent is obtained through rectification. The carbon sources of raw materials are all biological, the method is green and low-carbon, the product has a long-chain structure, and the product has flexibility, fatigue resistance and aging resistance, and can be further derived into functional silane such as amino, mercapto and thiocyanogen; the long-chain alkyl green silane coupling agent can be widely applied to high-end flexible composite materials such as flexible electronics and robot joints, and effectively improves the service life and safety of the materials.

The invention discloses an adsorption and impurity removal system for boron and phosphorus impurities in trichlorosilane, and relates to the technical field of polycrystalline silicon production.The adsorption and impurity removal system for boron and phosphorus impurities in trichlorosilane comprises a reactor, a feeding pipeline and a quantitative structure.The feeding pipeline is arranged on the reactor and used for conveying an adsorbent into the reactor, and the quantitative structure is arranged on the feeding pipeline; the quantitative structure comprises a centralizing box, a detection device, a supporting plate, a pushing plate and a first driver, the centralizing box is arranged on the throwing pipeline, a discharging opening is formed in the centralizing box and communicates with the throwing pipeline, the detection device is arranged at the bottom of an inner cavity of the centralizing box, and the supporting plate is movably arranged in the centralizing box and located at the top of the detection device; the detection device is used for detecting the weight of materials on the supporting plate, the pushing plate is movably arranged in the concentration box, and the first driver is installed on the concentration box, is in driving connection with the pushing plate and is used for driving the pushing plate to push the materials on the supporting plate to move towards the discharging port.

The invention relates to the technical field of organosilicon chemistry, and particularly discloses a synthesis method of chloromethyl phenethyl trichlorosilane. The preparation method specifically comprises the following steps: fully mixing trichlorosilane, chloropropene and chloromethyl styrene to obtain a mixed raw material; the preparation method comprises the following steps: mixing the raw materials in a reaction kettle, then introducing 9-11wt% of the mixed raw materials into the reaction kettle, then adding a platinum catalyst and an organic amine regulating agent, uniformly dispersing, then heating, dropwise adding the residual mixed raw materials into a reaction system, after dropwise adding, continuing to react for 2-4 hours, and finally sequentially cooling and rectifying to obtain a target product. According to the method disclosed by the invention, efficient conversion under a mild reaction condition is innovatively realized; the atom economy is excellent, the target product yield is remarkably improved, the whole technological process is stable, safe and controllable, the operation parameter window is wide, the adaptability is high, and outstanding industrial application potential and economic benefits are shown.

This invention discloses a method for reducing the background doping concentration in silicon carbide epitaxy. First, the silicon carbide reaction chamber is pretreated by baking it for 1-2 hours under high vacuum, high temperature, and low pressure conditions to remove air and moisture, effectively improving the cleanliness of the chamber. Then, before growing the epitaxial layer, ethylene gas is introduced to regulate the atmosphere of the reaction chamber, creating a carbon-rich environment that discourages the doping of impurity gases onto the epitaxial layer. Finally, the epitaxial layer is grown using chemical vapor deposition under high temperature and low pressure conditions, employing ethylene (C2H4) gas as the carbon source and trichlorosilane (SiHCl3) gas as the silicon source. By controlling the carbon-silicon flow ratio to a carbon-rich condition, the growth rate is accelerated during growth, thereby reducing the background doping concentration. Simultaneously, the carbon-rich condition also reduces the doping efficiency.

The invention discloses a trichlorosilane production system and method, the system comprises a reaction unit, a separation unit and a regeneration unit, the reaction unit comprises at least one fixed bed reactor, the separation unit comprises a main rectifying tower, and the regeneration unit comprises a side draw pump and a regeneration tower. According to the invention, the stripping section of the main rectifying tower is provided with the side line extraction port, and the extracted heavy component enriched material flow is introduced to the independent regeneration tower for in-vitro regeneration treatment, so that infinite accumulation of heavy components in a main circulation loop is fundamentally broken, and long-period and high-stability operation of trichlorosilane production is realized.

The invention discloses a polycrystalline silicon tail gas recovery system and method based on graded absorption and membrane separation coupling. The system comprises a pretreatment unit, a first absorption tower, a second absorption tower, a membrane separation and purification unit, an analysis and regeneration unit and a light component membrane removal unit. The pretreatment unit performs condensation, compression and gas-liquid separation on the reduction tail gas. The first absorption tower adopts high-purity silicon tetrachloride to remove hydrogen chloride; and the second absorption tower adopts an absorbent rich in trichlorosilane to deeply purify hydrogen. And refining the purified hydrogen through a membrane separator to obtain the electronic-grade high-purity hydrogen. Hydrogen chloride is desorbed from rich liquor from the two absorption towers in the desorption tower; and feeding the light-component-rich liquid extracted from the refluxing tank of the desorption tower into a pervaporation membrane assembly, selectively removing light components such as dichlorosilane and the like, and returning to the system. A traditional adsorption tower is omitted, the cryogenic energy consumption is reduced through graded absorption, and the industrial problem of light component circulation accumulation is solved while the high purity of hydrogen and hydrogen chloride products is guaranteed.

This invention relates to a method for efficiently removing methylchlorosilane impurities from trichlorosilane using Pt@ZIF-8 adsorbent. The invention employs Pt@ZIF-8 adsorbent to simultaneously adsorb methyldichlorosilane and dimethylchlorosilane impurities, achieving a groundbreaking and efficient simultaneous removal of these two impurities. The process is simple, requires low equipment investment and energy consumption, and achieves a removal rate of up to 83% for methyldichlorosilane and up to 85% for dimethylchlorosilane. This single adsorbent can efficiently remove both methyldichlorosilane and dimethylchlorosilane simultaneously, effectively solving the problem of difficult removal of methylchlorosilane impurities from trichlorosilane. Furthermore, the adsorbent is easy to separate and can be reused through desorption under nitrogen, saving costs and demonstrating potential application value in the industrial field.

The utility model discloses an energy-saving synthetic furnace for preparing trichlorosilane, which comprises a synthetic furnace component, the synthetic furnace component comprises a synthetic furnace main body, an outer sleeve sleeved on the outer wall of the synthetic furnace main body, a base arranged on the bottom surface of the synthetic furnace main body, and a threaded cover arranged above the outer sleeve; the heat preservation assembly comprises a first annular notch formed in the top face of the outer sleeve, a second annular notch formed in the top face of the outer sleeve, a first reflection aluminum foil layer arranged on the side face of the outer sleeve, and a second reflection aluminum foil layer arranged on the first reflection aluminum foil layer in a sleeved mode. According to the utility model, the synthetic furnace assembly and the heat preservation assembly are matched with each other, so that during use, multi-layer efficient heat preservation is formed on the synthetic furnace, too fast heat loss is avoided, power consumption is reduced, the environmental protection property of use is improved, and in the use process, the heat preservation reflecting layer can be directly taken out by the threaded cover and is convenient to replace, and the service life of the synthetic furnace is prolonged. And different thermal insulation layers can be conveniently selected to meet the use requirements.

The present application relates to the technical field of fluidized reaction, and discloses a fluidized bed reactor, application and a method for preparing trichlorosilane through cold hydrogenation reaction, wherein a first gas distributor is arranged in the reaction cavity of the fluidized bed reactor, a gas feeding section is formed between the first gas distributor and the bottom of the reaction cavity, an annular plate is arranged at the bottom of the reaction cavity and extends to the first gas distributor so as to separate the gas feeding section into a central chamber formed around the annular plate and an annular chamber located between the annular plate and the cavity wall of the reaction cavity, a second gas distributor is arranged in the central chamber, and a third gas distributor is arranged in the annular chamber. The present application has the advantages of improving the overall fluidization quality of the bed layer and the utilization rate of raw materials.

The invention discloses a Zr-MOFs adsorbent for adsorbing phosphorus impurities in trichlorosilane as well as a preparation method and application of the Zr-MOFs adsorbent, and belongs to the technical field of trichlorosilane purification. The preparation method disclosed by the invention comprises the following steps: adding a zirconium source compound into a solvent, and mixing to obtain a solution A; adding an organic ligand into a solvent, and mixing to obtain a solution B; adding a modifier into the solution A, and stirring to obtain a solution C; and adding the obtained solution B into the obtained solution C, carrying out a constant-temperature crystallization reaction in a microwave reactor, and after the reaction is finished, carrying out post-treatment on the obtained product to obtain the Zr-MOFs adsorbent. According to the scheme, the adsorbent is high in preparation efficiency, excellent in adsorption performance and low in cost, and phosphorus impurities in trichlorosilane can be deeply removed.

The invention discloses a method for removing trace boron and phosphorus impurities in trichlorosilane, which belongs to the technical field of chlorosilane purification, and comprises the following steps: adding a complexing agent into crude liquid trichlorosilane, carrying out complexation reaction, and rectifying the mixture obtained by the reaction to obtain the purified trichlorosilane, the cyclic siloxane and the chain siloxane have the advantages that the stability is high, new impurities are not easy to introduce, the compatibility with chlorosilane is good, and the like, so that ppb-level boron and phosphorus impurities can be efficiently removed; the trichlorosilane purified by the method is suitable for production of electronic-grade polycrystalline silicon.