This invention discloses a reactor and method suitable for
ultrafine particle vapor deposition, relating to the fields of
chemical engineering and
materials preparation technology. The reactor includes a reactor body, a feeding mechanism, and a gas-
solid feed
pipe connecting the reactor body and the feeding mechanism. The reactor body has a reaction
bed section, a conveying
bed section, and a descending
bed section connected in sequence. The
diameter ratio of the reaction bed section to the conveying bed section is greater than 1. At least one gas-phase
nozzle is provided on the descending bed section, and a control valve is connected to the end of the descending bed section. The control valve is connected to an outlet
pipe and a circulation
pipe connected to the feeding mechanism. Thus, by setting the reaction bed section and the conveying bed section with narrower diameters, the apparent gas velocity entering the conveying bed section is automatically adjusted, carrying the
solid product out for conveying. Simultaneously, the gas-phase
nozzle in the descending bed section provides conditions for the
solid product to undergo secondary reactions as needed. The selective connection of the control valve enables the extraction or circulation of the
solid product.