Synthetic method and apparatus for trichlorosilane

A technology of trichlorosilane and synthesis method, which is applied in the direction of silicon compounds, silicon halide compounds, chemical instruments and methods, etc., which can solve the problems of narrow particle size range of silicon powder, shutdown for maintenance, enrichment, etc., and achieve improved gas-solid contact Effect of area, reduction of difficulty and cost, and reduction of difficulty coefficient

A technology of trichlorosilane and synthesis method, which is applied in the direction of silicon compounds, silicon halide compounds, chemical instruments and methods, etc., which can solve the problems of narrow particle size range of silicon powder, shutdown for maintenance, enrichment, etc., and achieve improved gas-solid contact Effect of area, reduction of difficulty and cost, and reduction of difficulty coefficient

CN106915747AActive Publication Date: 2017-07-04XINTE ENERGY

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  • Synthetic method and apparatus for trichlorosilane

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Embodiment 1

[0026] This embodiment provides a method for synthesizing trichlorosilane, in which silicon powder with a particle size ranging from 200 to 400 meshes is reacted with hydrogen chloride to synthesize trichlorosilane.

[0027] Preferably, the temperature of the reaction is 300-600° C., and the pressure is 0.01-1 MPa.

[0028] More preferably, the reaction temperature is 320-400°C.

[0029] Preferably, the silicon powder is one or more of silicon 1501, silicon 1502, silicon 2202, silicon 2502, silicon 3303, silicon 411, silicon 421, silicon 441, silicon 551, and silicon 553.

[0030] Preferably, the method for obtaining the silicon powder is to obtain the silicon powder with a particle size ranging from 200 to 400 meshes by doping relatively small particle silicon powder into relatively large particle silicon powder.

[0031] The trichlorosilane synthesis method in this example uses silicon powder with a particle size range of 200 to 400 meshes to prepare trichlorosilane. The si...

Embodiment 2

[0033] like figure 1 As shown, the present embodiment provides the trichlorosilane synthesis device used in the trichlorosilane synthesis method in Example 1, including:

[0034] Reactor 1, used for reacting silicon powder with a particle size ranging from 200 to 400 meshes and hydrogen chloride to obtain a first mixture, the first mixture including trichlorosilane;

[0035] A cyclone separator 2 is connected to the reactor 1, and the cyclone separator 2 is used to separate the first mixture from the silicon powder of large particles and the second mixture by cyclone;

[0036] A bag filter 3 is connected to the cyclone separator 2, and the bag filter 3 is used to separate the second mixture by filtering the silicon powder of small particles and a third mixture, and the third mixture includes trichlorosilane . The main component in the third mixture is trichlorosilane, part of silicon tetrachloride, and a small amount of dichlorosilane and silicon monochloride.

[0037] The ...

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Abstract

The invention discloses a synthetic method and apparatus for trichlorosilane. According to the method, silicon powder with a particle size in a range of 200 to 400 meshes is used for reaction with hydrogen chloride so as to synthesize trichlorosilane; the used silicon powder has a wide particle size range and is low in production cost and reduced in the difficulty coefficient of production; and since the silicon powder in a wide particle size range has low fluidizing gas velocity, the mole fraction of corresponding introduced hydrogen chloride can be reduced during preparation of trichlorosilane, so difficulty of and cost for tail gas recovery is lowered. Compared with silicon powder used in preparation of trichlorosilane in the prior art, the silicon powder in a particle size range of 200 to 400 meshes in the invention has a greater specific surface area, so a gas-solid contact area is increased and reaction intensity is improved; and thus, the production power of the synthetic method and apparatus for trichlorosilane in the invention is improved.

Description

technical field [0001] The invention belongs to the technical field of polysilicon production, and in particular relates to a method and a device for synthesizing trichlorosilane. Background technique [0002] The production of trichlorosilane by the chlorination method is produced by the gas-solid heterogeneous reaction of metallurgical grade silicon powder and hydrogen chloride gas in a fluidized bed synthesis furnace. Large particle silicon powder in the diameter range, this production process has the following disadvantages: (1) the production cost of industrial silicon powder is high, because the particle size range of silicon powder is narrow, the difficulty of the production process increases, resulting in an increase in production costs; (2) The fluidization gas velocity of large-particle silicon powder is high. In order to ensure the fluidization effect, the flux of hydrogen chloride needs to be increased, resulting in excessive hydrogen chloride in the system, whic...

Claims

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Application Information

Patent Timeline
04 Jul 2017
Publication
CN106915747A
IPC
C01B33/107
CPC
C01B33/10763
Inventors
吴昌勇; 银波