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Process for rectifying trichlorosilane

A trichlorosilane and rectification technology, which is applied in the field of rectification technology, can solve the problems of not being able to meet the needs of the market, poor impurity removal ability, large investment, etc., and achieve product quality improvement, boron removal and carbon removal capabilities, The effect of improving yield and production efficiency

Inactive Publication Date: 2011-05-25
乐山永祥硅业有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Disadvantages of the traditional trichlorosilane crude product distillation process: the traditional trichlorosilane crude product rectification process only removes silicon tetrachloride and high boiling point compounds, as long as the product purity trichlorosilane mass percentage reaches 99.0%. Poor ability to remove trace impurities such as boron and carbon
[0004] The process parameters and route design in the above literature can only remove high boiling point compounds well, but have poor removal ability for trace impurities such as boron and carbon.
[0005] The production of high-purity trichlorosilane and silicon tetrachloride requires six rectification towers, which requires a large investment and high cost
[0006] To sum up, the products distilled by the traditional trichlorosilane crude product distillation process can no longer meet the needs of the market, and it is very necessary to modify the distillation process

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] A. The trichlorosilane feed liquid is fed to the middle of the first rectification tower through a magnetic pump, and the trichlorosilane product at the top of the tower flows to the middle of the second rectification tower, and the silicon tetrachloride in the bottom reboiler Pump to the finished product silicon tetrachloride storage tank; the operating temperature at the top of the first rectifying tower is 31.5°C, and the temperature of the reboiler is 57.5°C;

[0025] B, the distillate from the top of the second rectifying tower goes to the low boiler storage tank, and the feed liquid of the reboiler at the bottom of the tower is pumped to the middle of the third rectifying tower for feeding; the operating temperature at the top of the second rectifying tower is 23°C, the temperature of the reboiler is 30°C;

[0026] C. The distillate from the top of the third rectification tower is sent to the storage tank for low boilers, and the feed liquid of the reboiler at the...

Embodiment 2

[0031] A. The trichlorosilane feed liquid is fed to the middle of the first rectification tower through a magnetic pump, and the trichlorosilane product at the top of the tower flows to the middle of the second rectification tower, and the silicon tetrachloride in the bottom reboiler Pump to the finished product silicon tetrachloride storage tank; the operating temperature at the top of the first rectifying tower is 31.8°C, and the temperature of the reboiler is 57.8°C;

[0032] B, the distillate from the top of the second rectifying tower goes to the low boiler storage tank, and the feed liquid of the reboiler at the bottom of the tower is pumped to the middle of the third rectifying tower for feeding; the operating temperature at the top of the second rectifying tower is 31.8°C, the temperature of the reboiler is 35°C;

[0033] C. The distillate from the top of the third rectification tower is sent to the storage tank for low boilers, and the feed liquid of the reboiler at t...

Embodiment 3

[0038] A. The trichlorosilane feed liquid is fed to the middle of the first rectification tower through a magnetic pump, and the trichlorosilane product at the top of the tower flows to the middle of the second rectification tower, and the silicon tetrachloride in the bottom reboiler Pump to the finished product silicon tetrachloride storage tank; the operating temperature at the top of the first rectifying tower is 31.6°C, and the temperature of the reboiler is 57.6°C;

[0039] B, the distillate from the top of the second rectifying tower goes to the low boiler storage tank, and the feed liquid of the reboiler at the bottom of the tower is pumped to the middle of the third rectifying tower for feeding; the operating temperature at the top of the second rectifying tower is 25°C, the temperature of the reboiler is 32°C;

[0040] C. The distillate from the top of the third rectification tower is sent to the storage tank for low boilers, and the feed liquid of the reboiler at the...

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PUM

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Abstract

The invention relates to a process for rectifying trichlorosilane. In the process, trichlorosilane feed liquor passes through two sieve plate rectifying towers and two filler rectifying towers in turn to be rectified so as to obtain a high-purity trichlorosilane product, and a silicon tetrachloride product also can be obtained during rectification. Due to the design of the sequence of the sieve plate rectifying towers and the filler rectifying towers and the setting of a reflux ratio parameter, capability of removing trace impurities which cannot be removed by the conventional process flow can be improved, capability of removing boron and carbon is obviously improved, the separation effect is better, and the requirements of polycrystalline silicon manufacturers are met.

Description

technical field [0001] The present invention relates to a kind of rectification process, more specifically, the present invention relates to a kind of trichlorosilane rectification process. Background technique [0002] Disadvantages of the traditional trichlorosilane crude product distillation process: the traditional trichlorosilane crude product rectification process only removes silicon tetrachloride and high boiling point compounds, as long as the product purity trichlorosilane mass percentage reaches 99.0%. The ability to remove trace impurities such as boron and carbon is poor. [0003] The application number is 201010136534.9, and the invention patent titled "Rectification method of trichlorosilane and silicon tetrachloride" discloses a rectification method of trichlorosilane and silicon tetrachloride. The steps are: The mixture of silane and trace liquid impurities and trace solid impurities is passed into the evaporator to remove solid impurities, and the gas is c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
Inventor 梁进
Owner 乐山永祥硅业有限公司
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