Method for characterizing microstructure evolution of bonding area of IGBT (Insulated Gate Bipolar Translator) chip
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- BEIJING UNIV OF TECH
- Publication Date
- 2022-04-19
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Abstract
Description
technical field
[0001] The invention relates to the technical field of material microstructure characterization, in particular to a method for characterization of microstructure evolution in an IGBT chip bonding region. Background technique
[0002] With the development of the power electronics industry, IGBT modules, as the core power devices for power control and conversion, have been widely used in various occasions. However, during the service process, the IGBT chip is often subjected to repeated impacts of thermal stress, especially the bonding area between the bonding wire and the Al metallization layer, which will undergo microstructural evolution, resulting in degradation of its electrical properties, and eventually leading to failure of the IGBT module. . Therefore, in order to better improve the service reliability of the IGBT module, it is particularly important to study the evolution of the microstructure of the IGBT chip bonding area.
[0003] The existing sam...