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Microwave plasma chemical vapor deposition equipment

A chemical vapor deposition and microwave plasma technology, applied in the field of plasma, can solve problems such as affecting the service life of equipment and short service life of quartz glass, and achieve the effects of improving overall service life, improving service life and reducing damage

Pending Publication Date: 2022-04-22
成都纽曼和瑞微波技术有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the life of the quartz glass of the existing discharge cavity assembly is relatively short, which directly affects the service life of the entire equipment.

Method used

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  • Microwave plasma chemical vapor deposition equipment
  • Microwave plasma chemical vapor deposition equipment
  • Microwave plasma chemical vapor deposition equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] Please refer to figure 1 , this embodiment provides a microwave plasma chemical vapor deposition equipment 010 , which includes a frame, a microwave source 200 , a microwave transmission device 300 and a discharge chamber assembly 100 . The above-mentioned microwave source 200 is installed at one end of the frame, and is connected with the discharge chamber assembly 100 through a microwave transmission device 300 .

[0037] The above-mentioned microwave transmission device 300 includes a rectangular waveguide 310 and a tuning component 320 , the rectangular waveguide 310 is arranged horizontally, one end of which is connected to the microwave source 200 , and the other end is connected to the tuning component 320 . The tuning assembly 320 includes a horizontal part and a vertical part; wherein, the horizontal part is in the shape of a rectangular tube, and the vertical part is in the shape of a circular tube. The upper end of the vertical part is connected with the hor...

Embodiment 2

[0049] Please refer to Figure 9 , this embodiment provides another discharge chamber assembly 100, the structure of the discharge chamber 110 is the same as that of Embodiment 1, the difference is that the inner wall of the observation tube 120 in this embodiment is not provided with an annular groove 121, but is provided with The annular protrusion 122 is formed.

[0050] In the discharge chamber assembly 100 provided in this embodiment, an annular protrusion 122 is provided on the inner wall of each observation tube 120. After the annular groove 121 is provided, it can also annihilate part of the electrons in the observation tube 120, thereby reducing electron pairs. The damage of the quartz glass observation window 123 further improves the service life of the observation window 123 .

[0051] As a preference, please refer to Figure 10 , in other embodiments, a plurality of annular protrusions 122 arranged at intervals may also be provided on the inner wall of each obser...

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Abstract

The invention provides microwave plasma chemical vapor deposition equipment, and belongs to the field of microwave plasma. The deposition equipment comprises a microwave source, a microwave transmission device and a discharge cavity assembly, wherein the microwave source is connected with the discharge cavity assembly through the microwave transmission device. The discharge cavity assembly comprises a discharge cavity and an observation cylinder, and the observation cylinder is connected with the outer wall of the discharge cavity and communicates with an inner cavity of the discharge cavity; the inner wall of the observation cylinder is provided with at least one annular groove or annular protrusion. An annular groove or an annular bulge is arranged on the inner wall of the observation cylinder; electrons in the observation cylinder are annihilated, so that damage of the electrons to quartz glass is reduced, and the service life of the quartz glass is prolonged. According to the microwave plasma chemical vapor deposition equipment, after the discharge cavity assembly is adopted, the service life of the quartz glass on the observation cylinder is remarkably prolonged, so that the overall service life of the equipment is remarkably prolonged.

Description

technical field [0001] The invention relates to the field of microwave plasma, in particular to a microwave plasma chemical vapor deposition equipment. Background technique [0002] Microwave plasma chemical vapor deposition (MPCVD) is considered to be the first choice and the most advanced method for preparing high-quality diamond films in the world today; and the above methods require special microwave plasma chemical vapor deposition equipment. That is, the microwave deposits the carbon element in the reaction gas on the sample substrate by means of plasma discharge in the discharge chamber. And one of the core components of the above-mentioned deposition equipment is the discharge chamber, and in order to observe the situation of the sample substrate in the discharge chamber, an observation tube is generally installed on the discharge chamber, and quartz glass is arranged at the end of the observation tube; through the above-mentioned quartz glass, it can be observed Th...

Claims

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Application Information

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IPC IPC(8): C23C16/511C23C16/54C23C16/27
CPCC23C16/511C23C16/54C23C16/274
Inventor 黄春林刘文科冯智飞李俊宏季宇
Owner 成都纽曼和瑞微波技术有限公司