Gas dissociation circuit control device and system based on multi-coil coupling

A circuit control, multi-coil technology, applied in circuit devices, plasma, electrical components, etc., can solve the problems of low gas dissociation rate and lack of control of gas dissociation, and achieve the effect of improving gas dissociation rate

Pending Publication Date: 2022-05-13
江苏神州半导体科技有限公司
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

However, the gas dissociation lacks control in the prior art, and the gas dissociation rate is low

Method used

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  • Gas dissociation circuit control device and system based on multi-coil coupling
  • Gas dissociation circuit control device and system based on multi-coil coupling
  • Gas dissociation circuit control device and system based on multi-coil coupling

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Embodiment Construction

[0026] In order to make the purpose, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the present invention. Obviously, the described embodiments are part of the present invention Examples, not all examples. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention. Unless otherwise defined, the technical terms or scientific terms used herein shall have the usual meanings understood by those skilled in the art to which the present invention belongs. As used herein, "comprising" and similar words mean that the elements or items appearing before the word include the elements or items listed after the word and their equivalents, without excluding other el...

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Abstract

The invention provides a gas dissociation circuit control device based on multi-coil coupling, which is applied to a gas dissociation system, the gas dissociation system comprises a dissociation chamber and a gas dissociation circuit, and the gas dissociation circuit control device comprises an ionization rate detection device used for detecting the ionization rate of gas in the dissociation chamber; the gas dissociation circuit control device is used for controlling the gas dissociation circuit according to the ionization rate, the reference ionization rate, the current of the gas dissociation circuit and the reference current, the gas dissociation circuit is adjusted through the detected ionization rate, and the gas dissociation rate is conveniently increased. The invention further provides a gas dissociation system.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a gas dissociation circuit control device and a gas dissociation system based on multi-coil coupling. Background technique [0002] Plasma refers to an ionized gaseous substance composed of positive and negative ions produced by ionized atoms and atomic groups after partial electron deprivation. Generally, it can be generated by capacitive coupling or radio frequency inductive coupling. It can be obtained in the fields of materials, energy, information, etc. Wide range of applications. [0003] Plasma-assisted material processing has been widely used in many industrial plants. In the semiconductor and optoelectronics industries, plasmas are used in processes such as plasma enhanced chemical vapor deposition, physical vapor deposition, reactive ion etching and plasma immersion ion implantation. In addition, low-pressure plasmas are used for chamber cleaning a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/46H02J50/10H02J50/40
CPCH05H1/46H02J50/10H02J50/402
Inventor 潘小刚朱国俊
Owner 江苏神州半导体科技有限公司
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