Gas dissociation circuit control device and system based on multi-coil coupling

Abstract

The invention provides a gas dissociation circuit control device based on multi-coil coupling, which is applied to a gas dissociation system, the gas dissociation system comprises a dissociation chamber and a gas dissociation circuit, and the gas dissociation circuit control device comprises an ionization rate detection device used for detecting the ionization rate of gas in the dissociation chamber; the gas dissociation circuit control device is used for controlling the gas dissociation circuit according to the ionization rate, the reference ionization rate, the current of the gas dissociation circuit and the reference current, the gas dissociation circuit is adjusted through the detected ionization rate, and the gas dissociation rate is conveniently increased. The invention further provides a gas dissociation system.

Description

technical field

[0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a gas dissociation circuit control device and a gas dissociation system based on multi-coil coupling. Background technique

[0002] Plasma refers to an ionized gaseous substance composed of positive and negative ions produced by ionized atoms and atomic groups after partial electron deprivation. Generally, it can be generated by capacitive coupling or radio frequency inductive coupling. It can be obtained in the fields of materials, energy, information, etc. Wide range of applications.

[0003] Plasma-assisted material processing has been widely used in many industrial plants. In the semiconductor and optoelectronics industries, plasmas are used in processes such as plasma enhanced chemical vapor deposition, physical vapor deposition, reactive ion etching and plasma immersion ion implantation. In addition, low-pressure plasmas are used for chamber cleaning a...

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