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Overlay mark screening method, mask processing method and device, computer equipment, storage medium and program product

A computer program and screening method technology, applied in the field of lithography, can solve the problems of long running time and large amount of calculation, and achieve the effect of improving efficiency and reducing the amount of calculation.

Pending Publication Date: 2022-05-31
DONGFANG JINGYUAN ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In order to solve the problem of large amount of calculation and long running time in simulation optimization of overlay marking, the present invention provides a screening method for overlay marking, mask processing method, device, computer equipment, storage medium and program product

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  • Overlay mark screening method, mask processing method and device, computer equipment, storage medium and program product
  • Overlay mark screening method, mask processing method and device, computer equipment, storage medium and program product
  • Overlay mark screening method, mask processing method and device, computer equipment, storage medium and program product

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Embodiment Construction

[0046]In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the accompanying drawings and implementation examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0047] For ease of understanding, see figure 1 , here is an explanation of the overlay mark: the pattern on the wafer that is specially used to measure the overlay error is called an overlay mark. In order to accurately know whether the designed overlay mark is suitable, it is necessary to calculate the overlay mark. Overlay error measurement in overlay marks DBO (Diffraction Based Overlay, DBO) marks are mainly composed of dense periodic lines with a certain line width, uDBO (micro Diffraction Based Overlay, uDBO) marks are composed of horizontal lines with a certain offset Multi...

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Abstract

The invention relates to the technical field of photoetching, in particular to an overlay mark screening method, which comprises the following steps of: acquiring parameters of a plurality of groups of overlay marks to be screened; simplifying the overlay identifier to be screened based on a preset simplification standard to obtain a simplified overlay identifier; and screening the simplified overlay identifier based on a preset screening standard to obtain a screened overlay identifier. The invention further provides a mask processing method and device, computer equipment, a storage medium and a program product. According to the overlay identifier screening method, the mask processing method and device, the computer equipment, the storage medium and the program product provided by the invention, the technical problems that the overlay identifier simulation optimization calculation amount is large, the running time is long and the calculation resource demand is large are solved.

Description

【Technical field】 [0001] The invention relates to the field of photolithography technology, and in particular to a screening method for overlay marks, a mask processing method, a device, computer equipment, a storage medium and a program product. 【Background technique】 [0002] Multiple photolithography is required in the multi-layer manufacturing process of the chip. How to efficiently design a suitable overlay marking pattern for accurate measurement of the overlay error of the front and rear layers has become a technical problem that needs to be solved urgently. [0003] At present, the traditional screening method of overlay marks requires a lot of calculations and takes a long time. 【Content of invention】 [0004] In order to solve the problem of large amount of calculation and long running time for overlay logo simulation optimization, the present invention provides an overlay logo screening method, mask processing method, device, computer equipment, storage medium a...

Claims

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Application Information

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IPC IPC(8): G03F7/20G06F30/392G06F30/398
CPCG03F7/70491G03F7/70541G03F7/70633G06F30/392G06F30/398G06F2119/18
Inventor 兰涛明
Owner DONGFANG JINGYUAN ELECTRON LTD