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High-purity hydrogen peroxide preparation

A technology of high-purity hydrogen peroxide and hydrogen peroxide, applied in chemical instruments and methods, ion exchange column/bed method, peroxide/peroxy hydrate/peroxyacid/superoxide/ozonide, etc. It can solve problems such as complex process and achieve the effect of simple equipment, stable performance and easy operation

Inactive Publication Date: 2005-02-16
TIANJIN UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Chinese patent CN1330035A discloses an ion exchange resin purification method, which is complex in process

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] With 35% industrial hydrogen peroxide solution (see table 1 for impurities therein) with 12Hr -1 The empty column velocity continuously flows through the exchange column filled with bicarbonate type D296 anion exchange resin, and the exchange temperature is controlled at 5 °C; -1 The superficial velocity of the continuous flow through the packed H + Type D072 cation exchange resin exchange column, the exchange temperature is controlled at 5 ° C; then 12Hr -1 The superficial velocity continuously flows through the anion exchange resin packed with bicarbonate type D296 and H + Type D072 cation exchange resin mixed ion exchange resin (the volume ratio of anion exchange resin and cation exchange resin is 1:1) exchange column, the exchange temperature is controlled at 5 ℃.

[0015] The anion exchange resin is regenerated in the anion regeneration column, and the cation exchange resin is regenerated in the cation regeneration column. After the mixed ion exchange resin is pu...

Embodiment 2

[0024] 35% industrial hydrogen peroxide solution with 12Hr -1 The superficial velocity continuously flows through the exchange column filled with bicarbonate anion exchange resin, and the exchange temperature is controlled at 10°C; -1 The superficial velocity of the continuous flow through the packed H + Type cation exchange resin exchange column, the exchange temperature is controlled at 10 ℃; then with 12Hr -1 The superficial velocity continuously flows through the bicarbonate-type anion exchange resin and H + Type cation exchange resin mixed ion exchange resin (the volume ratio of anion exchange resin and cation exchange resin is 1:2) exchange column, the exchange temperature is controlled at 10 ℃.

[0025] Make raw material hydrogen peroxide aqueous solution contact with various ion exchange resins and purify with the same method among the example 1, various metal ion contents are as follows (table 3, table 4) in the hydrogen peroxide aqueous solution of gained:

[0026...

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Abstract

A process for preparing high-purity hydrogen peroxide from the aqueous solution of industrial hydrogen peroxide includes such steps as contacting with strong-alkaline macroreticular anionic exchange resin, contacting with strong-acidic macroreticular cationic exchange resin, contacting with mixed ionic exchange resin, and filtering via microfilter membrane. Its advantages are colourless, no order, high stability and purity, and low cost. It can be used as detergent for semiconductor chip.

Description

technical field [0001] The invention relates to the manufacture of electronic-grade high-purity hydrogen peroxide products, which mainly uses anion and cation exchange resins to remove organic and inorganic impurities in industrial hydrogen peroxide aqueous solutions, and uses microfiltration membranes to remove finely divided resin particles and impurities, thereby producing high-purity hydrogen peroxide products. Hydrogen peroxide products. The high-purity hydrogen peroxide aqueous solution prepared by the process is suitable for cleaning silicon wafers in the electronics industry. Background technique [0002] High-purity hydrogen peroxide is a necessary electronic chemical raw material in the production process of large-scale integrated circuits. It can be used as a cleaning agent to clean silicon wafers and integrated circuits to make high-quality insulating layers; it can also be used with water, inorganic acids, Organic stabilizer or ammonia water etc. can be made in...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J43/00B01J47/04C01B15/013
Inventor 马敬环唐娜赵永宏
Owner TIANJIN UNIV OF SCI & TECH
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