Silver halide emulsion and its production process, photosensitive silver halide material and its imaging method

A photosensitive material, silver halide technology, applied in photosensitive material, silver emulsification, optics, etc., can solve the problems of low fogging and pressure resistance, deterioration of emulsion pressure resistance, difficulty in obtaining, etc.

Inactive Publication Date: 2003-07-30
KONICA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Especially in the formation of grains, due to the presence of mercapto groups, so-called fog inhibitors, silver halide emulsions with less fog can be obtained, but at the same time, the pressure resistance of the emulsion is significantly deteriorated, so it is difficult to obtain low fog and resistance. Emulsion granules with both compression properties

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0181] "Preparation of Silver Halide Emulsion"

[0182] (Preparation of Silver Halide Emulsion G-1)

[0183] In 1 liter of 2% aqueous gelatin solution incubated at 40°C, control its pAg=7.3, pH=3.0, add the following A1 solution and B1 solution therein simultaneously with 20 minutes, then control its pAg=8.0, pH=5.5, And the following A2 solution and B2 solution were simultaneously added thereto over 100 minutes. Thereafter, pAg=8.0, pH=5.5 were controlled, and A3 solution and B3 solution described below were simultaneously added thereto for 5 minutes. At this time, pAg can be controlled by the method described in JP-A-59-45437, and pH can be controlled by sulfuric acid or sodium hydroxide aqueous solution.

[0184] (A1 solution)

[0185] Sodium chloride 0.48g

[0186] Potassium bromide 0.004g

[0187] Add water to make up to 28ml

[0188] (A2 solution)

[0189] Sodium chloride 116.9g

[0190] Potassium bromide 0.12g

[0191] K 2 IrCl 6 1.0×10 -5 g ...

Embodiment 2

[0285] "Preparation of Silver Halide Emulsion"

[0286] (Preparation of Green Sensitive Silver Halide Emulsion G2-14~G2-19)

[0287] In the preparation process of the silver halide emulsion G2-1 described in Example 1, except that KBr was added at a ratio of 0.28 g / mol AgX after 5 minutes after adding STAB-1 according to the predetermined amount, it was carried out in the same manner Chemical sensitization treatment to prepare G2-14. Then, G2-15 to G2-19 were prepared in the same way as G2-14, except that the position of the first addition of KBr and the interval between the first and second additions of KBr were changed as described in Table 6. The first and second additions of KBr were fixed at 0.28 g / mol Ag.

[0288] silver halide

[0289] (Preparation of cyan-sensitive and red-sensitive silver halide emulsions B2-14~B2-19, R2-14~R2-19)

[0290] Blue-sensitivity silver halide emulsions B2-14 to B2-19 and red-sensitivity silver halide emulsions R2-14 to R2-19 we...

Embodiment 3

[0296] Samples 1 to 19 of the foregoing Examples 1 and 2 were used to adopt semiconductor lasers (vibration wavelength is 650nm), He-Ne gas lasers (vibration wavelength is 544nm), Ar gas lasers (vibration wavelength is 458nm) as light sources, and Using a scanning exposure device whose beam raster overlap has been adjusted to 25%, AOM light quantity modulation is performed on each laser beam based on image data while reflecting with a polygon mirror to perform main scanning on a photosensitive material and at the same time The photosensitive material is conveyed (sub-scanned) in a direction perpendicular to the main scanning direction, and the exposure amount of each color is adjusted in such a way that the grayscale from the maximum density to the minimum density can be reproduced on a block image of 1 cm × 1 cm , while performing scanning exposure. One hour after the exposure was completed, the treatment was carried out according to the color development treatment 1 describe...

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PUM

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Abstract

The present invention relates to a silver halide emulsion, which is formed from silver chlorobromide grains or silver chloroiodobromide grains with a silver chloride content of 98% or more, and is characterized in that the silver chlorobromide grains or silver chloroiodobromide grains have A layer having a silver bromide content of 0.5 to 5% and covering a region 0 to 0.01 μm deep from the grain surface, and also to a silver halide emulsion containing a compound A having adsorption energy for silver and formed by chloride The formation of silver halide grains with a silver content of more than 90% is characterized in that the silver halide grains have a core and shell structure with different concentrations of compound A, and the concentration of compound A contained in the shell is higher than that of the compound contained in the core. The concentration of A is low.

Description

field of invention [0001] The present invention relates to a silver halide emulsion, a silver halide photosensitive material, a silver halide color photographic photosensitive material, an imaging method using these materials and a method for producing the silver halide emulsion. More specifically, the present invention relates to a silver halide emulsion which is excellent in developing stability and latent image stability at high-illuminance exposure, and which is excellent in fine-line reproduction stability, and which can always obtain stable high-quality prints regardless of the exposure method , Silver halide emulsions, silver halide photographic photosensitive materials, silver halide color photographs with high sensitivity, low fog, and excellent latent image stability from exposure to development, especially in the case of digital exposure with high-illuminance short-time exposure Photosensitive materials, imaging methods using these materials, and methods of making s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03C1/005G03C1/015G03C1/035G03C1/08G03C1/09G03C7/30
CPCG03C1/035G03C1/08G03C1/09G03C1/015G03C7/3041G03C1/0053G03C2001/03517G03C2001/03535G03C2001/091G03C2001/096G03C2200/26
Inventor 村上修二田中雄儿久保寺满广黑田浩一郎
Owner KONICA CORP
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