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218 results about "Maximum density" patented technology

The maximum density of a substance is the highest attainable density of the substance under given conditions.

Liquid and gas porous plastic filter and methods of use

The filtration device of the present invention relies on materials and methodologies that achieve the formation of a structural matrix that may later accommodate the addition of other adsorbent materials as opposed to merely binding adsorbent materials together through the use of compression and/or binder materials. The filter device of the present invention relies on (i) a unique method of processing to achieve maximum density of materials, (ii) a polymeric material having a distinct morphology and (iii) a very small micron diameter of the polymeric material to create uniformity. For example, in place of compression to increase density, the materials comprising the filtration device of the present invention are instead vibrated into a mold cavity. Thus, the methodology of the current invention optimizes how all of the materials comprising the filtration device fit together without compaction. The material being processed is vibrated as it is gradually poured into the mold. Once the mold cavity has been filled to a point where it will hold no more material, it is heated and then cooled. In place of an external binder, the structural material adheres to itself as it softens. This results in a tortuous path matrix of pores rather than an absolute pore barrier.
Owner:3M INNOVATIVE PROPERTIES CO

Porous polymer water filter and methods of use in refrigeration

The filtration device of the present invention relies on materials and methodologies that achieve the formation of a structural matrix that may later accommodate the addition of other adsorbent materials as opposed to merely binding adsorbent materials together through the use of compression and/or binder materials. The filter device of the present invention relies on (i) a unique method of processing to achieve maximum density of materials, (ii) a polymeric material having a distinct morphology and (iii) a very small micron diameter of the polymeric material to create uniformity. For example, in place of compression to increase density, the materials comprising the filtration device of the present invention are instead vibrated into a mold cavity. Thus, the methodology of the current invention optimizes how all of the materials comprising the filtration device fit together without compaction. The material being processed is vibrated as it is gradually poured into the mold. Once the mold cavity has been filled to a point where it will hold no more material, it is heated and then cooled. In place of an external binder, the structural material adheres to itself as it softens. This results in a tortuous path matrix of pores rather than an absolute pore barrier.
Owner:3M INNOVATIVE PROPERTIES CO

Epitaxially coated semiconductor wafer and process for producing it

A semiconductor wafer with a front surface and a back surface and an epitaxial layer of semiconducting material deposited on the front surface. In the semiconductor wafer, the epitaxial layer has a maximum local flatness value SFQRmax of less than or equal to 0.13 μm and a maximum density of 0.14 scattered light centers per cm2. The front surface of the semiconductor wafer, prior to the deposition of the epitaxial layer, has a surface roughness of 0.05 to 0.29 nm RMS, measured by AFM on a 1 μm×1 μm reference area. Furthermore, there is a process for producing the semiconductor wafer. The process includes the following process steps: (a) as a single polishing step, simultaneous polishing of the front surface and of the back surface of the semiconductor wafer between rotating polishing plates while an alkaline polishing slurry is being supplied, the semiconductor wafer lying in a cutout of a carrier whose thickness is dimensioned to be 2 to 20 μm less than the thickness of the semiconductor wafer after the latter has been polished; (b) simultaneous treatment of the front surface and of the back surface of the semiconductor wafer between rotating polishing plates while a liquid containing at least one polyhydric alcohol having 2 to 6 carbon atoms is being supplied; (c) cleaning and drying of the semiconductor wafer; and (d) deposition of the epitaxial layer on the front surface of the semiconductor wafer produced in accordance with steps (a) to (c).
Owner:SILTRONIC AG

Pixel-density augmentation and adjustment with minimum data, in an incremental printer

One invention form is a method using all input data for one or preferably plural colorants, one time to control colorant deposition in forming a pixel array on a printing medium, and at least one other time to control deposition of more of the same colorants. At least one "applying" includes choosing data-array pixels to deposit added colorant. The two data-usage times can be associated directly with depositing colorant in respective printer passes; or may be done at (or near) rendition, sending output data to printmasking for pass allocation. Selection preferably includes setting maximum density on the medium-and choosing locations for that density, best by analyzing data to find locally dense areas, e. g. counting neighboring pixels. Selecting also includes defining locations to receive particular density, and creating additional density levels based on densities in the data array. Another method form includes defining an augmentation array and applying it to control part of colorant deposition. Preferably also included is applying the original array to control other deposition of colorant. Applying the augmentation array preferably increases colorant deposition, relative to applying the original array, by less than 100% with non-linear response to data.
Owner:HEWLETT PACKARD DEV CO LP

Intercalated layered double hydroxide smoke inhibitor and preparation method thereof

The invention discloses an intercalated layered double hydroxide smoke inhibitor and a preparation method thereof. The smoke inhibitor is a layered structural material formed by assembling a laminated sheet consisting of metal cations and interlayer anions, wherein a specific composition general formula of the smoke inhibitor is M<2+>1-xM<3+>x(OH)2(A<n->)n / 2.mH2O. According to the preparation method disclosed by the invention, the intercalated layered double hydroxide smoke inhibitor is prepared by adopting a one-step coprecipitation method or a clean hydrothermal reaction at one step; the preparation method is simple and practical; according to the obtained intercalated layered double hydroxide smoke inhibitor, smoke inhibiting groups such as molybdate anions, an octamolybdate radical, a cuprate radical and a stannate radical are arranged at an interlayer, and smoke inhibiting elements such as iron and copper are introduced into the laminated sheet, so that a good carbon forming effect is realized, the smoke generating amount can be reduced, and the smoke inhibiting effect is synergically enhanced; meanwhile, a layered double hydroxide laminated sheet forms an alkaline porous substance at high temperature; the alkaline porous substance has greater specific surface area and can effectively adsorb smog; the prepared intercalated layered double hydroxide smoke inhibitor is applied to an ordinary rubber-plastic product and a high-temperature rubber-plastic product; the maximum density (Ds, max) at low additive amount (1phr) can be reduced by 87.3 percent; the intercalated layered double hydroxide smoke inhibitor is remarkable in smoke inhibiting effect and is a smoke inhibitor material with excellent performance.
Owner:BEIJING UNIV OF CHEM TECH
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