Supercharge Your Innovation With Domain-Expert AI Agents!

Container for storaging high purity liquid chemical

A chemical and high-purity technology, applied in the field of containers for storing liquid chemicals, can solve the problems of container 1 expansion, deformation, danger, dumping, etc., and achieve the effect of less bending area, maintaining stability of placement, and reducing dead angles

Inactive Publication Date: 2004-12-22
MERCK KANTO ADVANCED CHEM
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The vapor pressure of the liquid chemical inside the container 1 will increase with the temperature rise or the vibration generated during transportation, which will cause the expansion and deformation of the container 1, and often make the circular inner concave surface 16 of the bottom 14 of the container expand outward It is oval-shaped and arched, causing the container 1 to be unable to stand stably, shake or even fall over
As a result, there may be a danger

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Container for storaging high purity liquid chemical
  • Container for storaging high purity liquid chemical
  • Container for storaging high purity liquid chemical

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] The container used for storing high-purity liquid chemicals in the present invention includes a hollow body and a sealing cover; the hollow body is used for holding high-purity liquid chemicals, such as strong acid, strong alkali and organic / inorganic solution, etc., and its top is placed There is an opening, the periphery of the bottom of which is provided with three protrusions arranged in a non-colinear arrangement and extending downwards respectively to support the hollow body, and the sealing cover is used to seal the opening at the top of the hollow body. The non-collinear arrangement of three convex columns at the bottom of the container used for storing high-purity liquid chemicals in the present invention constitutes a coplanar surface, providing a stable bottom support surface for the container. When the container of the present invention used for storing high-purity liquid chemicals increases the internal pressure of the container due to the increase of the va...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A container for high-purity liquid chemical features that its bottom has a 3 convex parts whose bottoms are on a common supporting plane. When the internal pressure of container is increased, the container can be deformed but said 3 convex parts can increase the stability of said container.

Description

technical field [0001] The invention relates to a container for storing liquid chemicals; in particular, it relates to a container for storing high-purity liquid chemicals used in semiconductor and liquid crystal display production technology. Background technique [0002] With the rapid expansion of high-tech industries, from semiconductor manufacturing and flat panel display industry to flip-chip packaging and gallium arsenide compound semiconductors, various liquid chemicals need to be used. For example, silicon dioxide etchant, polysilicon etchant, aluminum etchant and copper etchant are used in the wet etching process of various semiconductor factories; metal and non-metallic etchant such as indium tin oxide etchant and chromium etchant are used in the flat panel display industry etching solution. Various organic and inorganic developers and cleaning solvents are used in the lithography production process. The chemical mechanical polishing process requires the use of ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B65D1/00B65D85/84
Inventor 吕学营张家华黄国雄田欧特
Owner MERCK KANTO ADVANCED CHEM
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com