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DC electric arc plasma chemical vapor deposition apparatus and diamond coating method

A chemical vapor deposition, DC arc technology, applied in metal material coating process, coating, gaseous chemical plating and other directions, can solve technical difficulties and other problems, achieve stability improvement, life and structural stability improvement, quality improvement Effect

Inactive Publication Date: 2005-06-29
UNIV OF SCI & TECH BEIJING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It is very difficult technically to maintain such a long hot W wire working stably for a long time

Method used

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  • DC electric arc plasma chemical vapor deposition apparatus and diamond coating method
  • DC electric arc plasma chemical vapor deposition apparatus and diamond coating method
  • DC electric arc plasma chemical vapor deposition apparatus and diamond coating method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] The product to be coated with diamond coating is placed on the product rack, and it is diamond-coated using the process conditions listed in Table 1:

[0024] Argon gas flow(L / min)

[0025] Among them, argon is the protective gas used, while hydrogen and methane are the necessary reaction gases for depositing diamond. Adjust the pressure in the vacuum chamber, DC discharge voltage, and current to 1kPa, 120V, and 150A, respectively, and the surface temperature of the product to be coated is 900°C. Treat the product coating for 6 hours to obtain such as image 3 Diamond coating shown.

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Abstract

The invention provides a DC arc plasma chemical vapor deposition device and a diamond coating method. The coating device consists of a cathode part, an anode, a vacuum chamber, a vacuum pump system, a pressure measurement and control device, a DC arc column, a product rack, a power supply, and a magnetic field coil; the cathode part (1) and the anode (8) are in a cylindrical vacuum chamber (2) Both ends of the axis; a pair of magnetic field coils (12), (13) are coaxially located on the upper and lower sides outside the vacuum chamber (2); the vacuum chamber (2) and the vacuum pump system (3), pressure measurement and control Devices (4) are connected by vacuum lines. The cathode part (1) is composed of cathode rod (6), cathode body (7), protective gas channel body (14), reaction gas channel body (15) and insulators (17), (18); in the protective gas channel body (14), below the reaction gas channel body (15) is the cathode nozzle (16). The invention has the advantages that: the service life and structure stability will be greatly improved, the reliability will be improved, and the quality of the diamond coating will be significantly improved.

Description

technical field [0001] The invention belongs to the technical field of diamond coating, and in particular provides a high-current DC arc plasma chemical vapor deposition device and a diamond coating method, which can be applied to coating the surface of a product with a diamond coating. Background technique [0002] Diamond coatings prepared by chemical vapor deposition have many unique characteristics, such as high hardness, high elastic modulus, low friction coefficient, high thermal conductivity, wide optical transmission band, high dielectric properties, high chemical inertness, etc. An extremely excellent multi-functional material has broad application prospects in various fields of the national economy. [0003] A variety of chemical vapor deposition methods can be used to prepare diamond coatings, the most important feature of which is its respective plasma generation technology. The hot wire method uses a large number of metal wires arranged in parallel and heated t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/27C23C16/503
Inventor 唐伟忠李成明吕反修陈广超佟玉梅宋建华刘素田
Owner UNIV OF SCI & TECH BEIJING
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