Organic light emitting display device and its mfg. method
A technology for display devices and organic layers, which can be used in identification devices, lighting devices, electroluminescent light sources, etc., and can solve the problems of increased production costs
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[0021] Such as Figure 1A As shown, the buffer layer 110 (or diffusion barrier layer) can be deposited on the substrate 100 by plasma enhanced chemical vapor deposition (PECVD), low pressure chemical vapor deposition (LPCVD), sputtering and other methods. This may be done to prevent impurities such as metal ions from the substrate 100 from diffusing and penetrating into the active layer (polysilicon).
[0022] The substrate 100 may be a suitable substrate such as a glass or plastic substrate.
[0023] After the buffer layer 110 is formed, an amorphous silicon (amorphous Si) layer may be deposited on the buffer layer 110 by using methods such as PECVD, LPCVD, and sputtering. Dehydrogenation can then be carried out in a vacuum furnace. When the amorphous silicon layer is deposited by LPCVD or sputtering, dehydrogenation may not be required.
[0024] Polysilicon may be formed by crystallizing the amorphous silicon layer by using an amorphous silicon crystallization process in w...
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