Method for preparing alumina/monox composite mill grain

A technology of composite abrasive grains and alumina, applied in polishing compositions containing abrasives, fibrous fillers, etc., can solve the problems of surface damage of polishing liquid, irregular particle shape, scratches, etc., to reduce roughness, improve Microscopic condition, improvement of polishing scratches and surface damage

Inactive Publication Date: 2006-10-25
SHANGHAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Abrasive system is the main component in chemical mechanical polishing fluid, α-Al 2 o 3 Is currently widely used abrasives, but α-Al 2 o 3 The particle hardness is relatively large, commercially available α-Al 2 o 3 After the powder is dispersed, the shape of t

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] Add a certain amount of α-Al in deionized water 2 o 3 , formulated as a 10wt% aqueous solution; commercially available α-Al 2 o 3 The average particle size is 0.3um; then add a concentration of 5% NaOH solution and 1% dilute H 2 SO 4 , adjust the pH value to 9; then add 4g of dispersant sodium hexametaphosphate, stir evenly with a mixer, then carry out ultrasonic dispersion, and then carry out ball mill dispersion to obtain α-Al 2 o 3 Dispersion 2000 ml.

[0015] The above 2000ml α-Al 2 o 3 The dispersion was heated to a reaction temperature of 90°C, and 267 ml of 0.25 mol / L Na 2 SiO 3 and 1% dilute H 2 SO 4 , keep the pH value of the solution at 9; after the reaction is completed, age for 2 hours, then centrifuge, purify, and dry, and finally obtain a SiO-coated 2 2 wt% alumina / silica composite abrasive grains.

Embodiment 2

[0017] Add a certain amount of α-Al in deionized water 2 o 3 , formulated as a 10wt% aqueous solution; commercially available α-Al 2 o 3 The average particle size is 0.3um; then add a concentration of 5% NaOH solution and 1% dilute H 2 SO 4 , adjust the pH value to 9; then add 4g of dispersant sodium hexametaphosphate, stir evenly with a mixer, then carry out ultrasonic dispersion, and then carry out ball mill dispersion to obtain α-Al 2 o 3 Dispersion 2000 ml.

[0018] The above 2000ml α-Al 2 o 3 Heat the dispersion to a reaction temperature of 90°C, add 666.7 ml of 0.25 mol / L Na 2 SiO 3 and 1% dilute H 2 SO 4 , keep the pH value of the solution at 9; after the reaction is completed, age for 2 hours, then centrifuge, purify, and dry, and finally obtain a SiO-coated 2 5 wt% alumina / silica composite abrasive grains.

Embodiment 3

[0020] The steps of this embodiment are basically the same as those of the above-mentioned embodiment 1, the difference is: in 2000 milliliters of α-Al 2 o 3 Add 1000 ml of 0.33mol / L Na to the dispersion 2 SiO 3 and 1.3% dilute H 2 SO 4 ; Finally, coated with SiO 2 10 wt% alumina / silica composite abrasive grains.

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Abstract

The invention relates to a manufacture method for alumina/silicon oxides compounding mill grain that includes the following steps: making alpha-Al2O3 dispersing liquid; adding alpha-Al2O3 and dispersing agent hexametaphosphate into deionized water, whisking to equal, adding dilute base and diluted acid solution to adjust the pH value to 9, taking ultrasound dispersing and ball milling dispersing; heating the temperature to 80-100 degree centigrade and adding Na2SiO3 and H2SO4 into the alpha-Al2O3 dispersing liquid, after reacting, aging for 2 hours, taking centrifugal separating, purifying, drying and gaining the product. The polishing fluid made from the product would obviously decrease the roughness and waviness of the surface after the hard disk basal piece and disc glass basal piece.

Description

technical field [0001] The invention relates to a method for preparing alumina / silicon oxide composite abrasive grains, which belongs to the technical field of preparation technology of abrasives for high-precision polishing. Background technique [0002] In recent years, with the rapid increase of memory hard disk capacity and storage density, the flying height of the computer head has been reduced to about 10nm. With the head running so close to the disk, the demands on the surface quality of the disk are getting higher and higher. If the surface roughness and waviness of the hard disk are too large, the head will collide with the surface of the disk during high-speed rotation, which will damage the head or the magnetic medium on the surface of the hard disk, resulting in failure of the disk device or failure of reading and writing information. mistake. Therefore, before forming a magnetic medium, the disk substrate must be polished to minimize the surface roughness and ...

Claims

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Application Information

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IPC IPC(8): C09C1/68C09G1/02
Inventor 雷红张鹏珍卢海参张泽芳肖保其
Owner SHANGHAI UNIV
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