Radiation sensitive resin composite, prominency formed therewith, separator and its producing method and liquid crystal display component

A technology of liquid crystal display element and resin composition, which is applied in the direction of nonlinear optics, photoplate process of patterned surface, optics, etc., can solve problems such as poor development and poor display elements, and achieve excellent adhesion, high Reliability, effect of solving precipitation problems

Inactive Publication Date: 2006-11-01
JSR CORPORATIOON
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, after dissolving and removing the unexposed part after the spacer formation, the photopolymerization initiator is precipitated in the developer after development, and the precipitated photopolymerization initiator adheres to the substrate again, causing a problem that the display device is not good. , or the problem that the photopolymerization initiator is precipitated in the developing tank and developing nozzle of the developing device, resulting in poor development, etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Radiation sensitive resin composite, prominency formed therewith, separator and its producing method and liquid crystal display component

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0192] Hereinafter, examples and comparative examples are shown to describe the present invention more specifically, but the present invention is not limited to these examples.

Synthetic example 1

[0194] In a flask equipped with a cooling tube and a stirrer, add 5 parts of 2,2'-azobisisobutyronitrile and 250 parts of diethylene glycol methyl ethyl ether, and then add 35 parts of 2-methacryloyloxyethyl Succinic acid, 25 parts of n-butyl methacrylate, 35 parts of benzyl methacrylate, after nitrogen replacement, add 5 parts by weight of 1,3-butadiene, stir slowly and raise the temperature of the solution to 90°C The temperature was maintained for 5 hours for polymerization to obtain a [A] copolymer solution with a solid content concentration of 28.0%. This is referred to as [A-1] polymer.

[0195] The obtained polymer [A-1] measured Mw using GPC (Gel Permeation Chromatography) HLC-8020 (trade name, manufactured by Tosoh Co., Ltd.), and found to be 12,000.

Synthetic example 2

[0197] In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts of diethylene glycol methyl ethyl ether are added, and then 18 parts are added Methacrylic acid, 40 parts of glycidyl methacrylate, 5 parts by weight of styrene, 32 parts of methacrylic acid tricyclic [5.2.1.0 2,6 ] Dec-8-yl ester, after nitrogen replacement, add 5 parts of 1,3-butadiene, stir slowly and raise the temperature of the solution to 70°C, keep the temperature for 5 hours to polymerize to obtain copolymer [A -2] solution.

[0198] The solid content concentration of this solution was 33.0% by weight, and the Mw of the copolymer [A-2] was 11,000.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

Provided are a radiation sensitive resin composition, a protrusion and a spacer formed from the composition which have improved various capabilities such as pattern form, spacer strength, rubbing resistance, close adhesion with transparent substrate, and heat resistance, and a liquid crystal display device comprising them which exhibits high reliability for a long time. The radiation sensitive resin composition comprises [A] copolymer of ethylenically unsaturated carboxylic acid and(or) ethylenically unsaturated carboxylic anhydride(a1) and ethylenically unsaturated compound other than (a1), [B] polymerizable compound having ethylenically unsaturated bond, and [C] photopolymerization initiator. The amount of the photopolymerization initiator is 0.1-5 parts by weight in respect to 100 parts by weight of the ingredient [B]. The method for simultaneously forming the protrusion and spacer of the liquid crystal display device comprises the steps of (i) forming a coating of the radiation sensitive composition on substrate, (ii) irradiating at least a part of the coating under low oxygen condition, (iii) developing the substrate, and (iv) heating the substrate.

Description

Technical field [0001] The present invention relates to a radiation-sensitive resin composition for simultaneously forming protrusions and spacers of a vertical liquid crystal display element, protrusions and spacers formed from the composition, and liquid crystal displays comprising the protrusions and spacers element. Background technique [0002] Liquid crystal display panels are currently widely used in flat panel displays. In particular, with the promotion of OA equipment such as personal computers and word processors, and liquid crystal televisions, the requirements for the display quality of TFT (thin film transistor) liquid crystal display panels (TFT-LCD) have become more and more stringent. [0003] Among TFT-LCDs, TN (Twisted Nematic) LCDs are now the most widely used. The LCD is manufactured by the following method: a polarizing film with a 90-degree difference in orientation direction is arranged on the outer side of two transparent electrodes, and an alignment film ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G02F1/1333G03F7/028G03F7/20
CPCG03F7/0007G03F7/027G03F7/028G03F7/033
Inventor 一户大吾浜口仁梶田彻
Owner JSR CORPORATIOON
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products