Chemical and mechanical water-free polishing liquid for lithium-cessium borate crystal and leveling method
A chemical-mechanical and polishing liquid technology, used in polishing compositions containing abrasives, machine tools for surface polishing, and grinding/polishing equipment, etc. The problem of low finish is to improve the finish, reduce the surface unevenness, and improve the polishing efficiency.
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Embodiment 1
[0025] Describe the preparation process of the present invention with embodiment 1:
[0026] First, the particle size of 100nm nano-SiO 2 Abrasive 4kg is dissolved in the organic solvent polyethylene glycol 93.9kg, then in the solution, add organic base triethanolamine 0.1kg to adjust the pH value of the solution to 8.5~9.5, add active agent Oπ-72kg, get the polishing solution of the present invention after stirring evenly .
[0027] The polishing liquid obtained in Example 1 was used for processing: when the polishing pressure was set to 0.05 MPa and the rotational speed was 50-60 r / min, the CLBO crystal was chemically mechanically polished for 5 minutes to obtain a globally flattened crystal surface.
[0028] The polishing liquid obtained in Example 2 was used for processing: when the polishing pressure was set to 0.08 MPa and the rotational speed was 30-40 r / min, the CLBO crystal was chemically mechanically polished for 10 minutes to obtain a globally flattened crystal sur...
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